The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2016
Filed:
Jun. 25, 2013
Applicants:
Dow Global Technologies Llc, Midland, MI (US);
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Inventors:
Matthew D. Christianson, Midland, MI (US);
Matthew M. Meyer, Midland, MI (US);
Owendi Ongayi, Marlborough, MA (US);
Assignee:
DOW GLOBAL TECHNOLOGIES LLC, Midland, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); C08F 14/18 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); C08F 14/185 (2013.01); G03F 7/00 (2013.01);
Abstract
A copolymer comprises the polymerized product of a dissolution-rate controlling monomer having the formula (I), an acyclic vinyl ether monomer of the formula (II), and a cyclic vinyl ether monomer of the formula (III): wherein R, R, R, L, X, and Zare defined herein. A photoresist composition comprising the copolymer is described, as is an article coated with the photoresist composition, and a method of forming an electronic device using the photoresist composition.