The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2015
Filed:
Feb. 21, 2014
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Owendi Ongayi, Marlborough, MA (US);
James W. Thackeray, Braintree, MA (US);
James F. Cameron, Brookline, MA (US);
ROHM AND HAAS ELECTRONIC MATERIALS LLC, Marlborough, MA (US);
Abstract
A copolymer includes the polymerized product of a comonomer and a monomer having the formula (I): wherein c is 0, 1, 2, 3, 4, or 5; Ris H, F, —CN, Calkyl, or Cfluoroalkyl; Rand Rare each independently an unsubstituted or substituted Clinear or branched alkyl group, an unsubstituted or substituted Ccycloalkyl group, an unsubstituted or substituted Calkenylalkyl group, or an unsubstituted or substituted Calkynylalkyl group; wherein Rand Rtogether optionally form a ring; and Ris a Caryl group substituted with an acetal-containing group or a ketal-containing group, or a C-Cheteroaryl group substituted with an acetal-containing group or a ketal-containing group, wherein the Caryl group or the C-Cheteroaryl group can, optionally, be further substituted. Also described are a photoresist including the copolymer, a coated substrate having a layer of the photoresist, and a method of forming an electronic device utilizing the photoresist.