The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2017
Filed:
Oct. 30, 2014
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Vipul Jain, North Grafton, MA (US);
Owendi Ongayi, Marlborough, MA (US);
James W. Thackeray, Braintree, MA (US);
James F. Cameron, Brookline, MA (US);
ROHM AND HAAS ELECTRONIC MATERIALS LLC, Marlborough, MA (US);
Abstract
A copolymer includes repeat units derived from an acid-labile monomer, an aliphatic lactone-containing monomer, a Calkyl (meth)acrylate in which the Calkyl group includes a specific base-soluble group, a photoacid-generating monomer that includes an aliphatic anion, and a neutral aromatic monomer having the formula wherein R, R, R, X, m, and Rare defined herein. The copolymer is used as a component of a photoresist composition. A coated substrate including a layer of the photoresist composition, and a method of forming an electronic device using the coated substrate are described.