The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2015
Filed:
Oct. 30, 2014
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Owendi Ongayi, Marlborough, MA (US);
Vipul Jain, North Grafton, MA (US);
James F. Cameron, Brookline, MA (US);
James W. Thackeray, Braintree, MA (US);
Suzanne Coley, Mansfield, MA (US);
ROHM AND HAAS ELECTRONIC MATERIALS LLC, Marlborough, MA (US);
Abstract
A copolymer includes repeat units derived from a lactone-substituted monomer, a base-soluble monomer having a pKless than or equal to 12, a photoacid-generating monomer, and an acid-labile monomer having the formula wherein R, R, R, and Ar are defined herein. The copolymer can be used as a component of a photoresist composition, and the photoresist composition can be coated on a substrate having one or more layers to be patterned, or used in a method of forming an electronic device.