Hitachi, Japan

Osamu Miura


Average Co-Inventor Count = 7.8

ph-index = 9

Forward Citations = 246(Granted Patents)


Location History:

  • Hitachi, JP (1989 - 1996)
  • Ibaraki-ken, JP (1996 - 2001)

Company Filing History:


Years Active: 1989-2001

where 'Filed Patents' based on already Granted Patents

11 patents (USPTO):

Title: Osamu Miura: A Visionary Inventor Shaping Technological Advancement

Introduction:

Osamu Miura, a pioneering inventor based in Hitachi, Japan, has made significant contributions to the world of technology through his relentless pursuit of innovation. With a total of 11 patents to his name, Miura's work continues to inspire and influence future generations of inventors.

Latest Patents:

1. Thin-film multilayer wiring board with wiring and via holes in a thickness of an insulating layer: This patent describes a groundbreaking thin-film multilayer wiring board with metallic wiring layers and via holes in an organic insulating layer, enhancing electrical connectivity.

2. Thin-film multilayer wiring board and production thereof: Miura's innovation in this patent focuses on improving wiring density and signal transmission performance in thin-film multilayer wiring boards through precise manufacturing processes.

Career Highlights:

Miura's exceptional career includes impactful roles at renowned companies such as Hitachi, Ltd. and Hitachi Chemical Company, Ltd. His expertise in technological advancements has led to the development of cutting-edge solutions that have revolutionized the industry.

Collaborations:

Throughout his career, Miura has collaborated with esteemed colleagues including Ryuji Watanabe and Kunio Miyazaki. Together, they have brought forth innovative ideas and solutions that have shaped the landscape of technology.

Conclusion:

Osamu Miura's visionary approach to invention and his dedication to pushing the boundaries of technological innovation have established him as a prominent figure in the field. His patents and collaborations stand as a testament to his invaluable contributions towards advancing technology for the betterment of society.

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