Yokohama, Japan

Osamu Arisumi

This inventor holds 21 USPTO granted patents, primarily in Semiconductor Manufacturing. Top assignees: Kabushiki Kaisha Toshiba, Infineon Technologies Ag, Toshiba Memory Corporation. Active years: 1997-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Osamu Arisumi. Retrieved from https://idiyas.com/inventor/osamu-arisumi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 42.9

Average Co-Inventor Count = 2.8

ph-index = 5

Forward Citations = 524(Granted Patents)


Location History:

  • Kanagawa-ken, JP (2006)
  • Tokyo, JP (1997 - 2009)
  • Yokohama, JP (1999 - 2012)
  • Mie, JP (2014 - 2016)
  • Kuwana, JP (2017 - 2019)

Company Filing History:


Years Active: 1997-2019

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Areas of Expertise:
Semiconductor Device
Manufacturing Method
Ferroelectric Capacitor
Crystalline Insulation Film
Thin Film Heat Treatment
Polysilazane Solution
Liquid Container
Mask Pattern
Insulated-Gate Transistor
Trench Filling
Perovskite Type Oxide
Capacitor Manufacturing
21 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Osamu Arisumi in Semiconductor Technology**

Introduction

Osamu Arisumi is a notable inventor based in Yokohama, Japan, recognized for his significant contributions to the field of semiconductor technology. With a remarkable portfolio of 21 patents, Arisumi's work has shaped advancements in manufacturing processes and device efficiency. His expertise is evident in his latest innovations focusing on optimizing semiconductor devices.

Latest Patents

Among Osamu Arisumi's notable patents is the "Semiconductor device and method for manufacturing same." This patent outlines a sophisticated design where the source layer is comprised of a semiconductor layer that incorporates a dopant. The columnar portions are strategically placed between separation portions, extending through the stacked body and semiconductor layer. Furthermore, the inclusion of a dopant diffusion prevention film differentiates areas within the semiconductor layer, highlighting Arisumi's intricate understanding of material properties and device architecture.

Career Highlights

Osamu Arisumi has had a distinguished career, having worked for prominent companies such as Kabushiki Kaisha Toshiba and Infineon Technologies AG. His experiences at these organizations have undoubtedly influenced his innovative approach to semiconductor design and manufacturing. His accumulated knowledge and practical applications have made significant impacts within the industry.

Collaborations

Throughout his career, Arisumi has collaborated with notable colleagues, including Masahiro Kiyotoshi and Koji Yamakawa. These partnerships have fostered an environment of innovation, enabling the development of cutting-edge semiconductor technologies that contribute to the broader field.

Conclusion

Osamu Arisumi's ongoing contributions to semiconductor technology through his numerous patents underscore his pivotal role as an inventor. His latest innovations not only enhance manufacturing processes but also lay the groundwork for future advancements. As the semiconductor industry continues to grow, figures like Arisumi will remain essential in driving technological progress and innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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