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For the Inventor, By the Inventor

Meylan, France

Olivier Joubert

This inventor holds 30 USPTO granted patents and 5 published patent applications and 6 EPO patents, primarily in Microelectronics Processing. Top assignees: Applied Materials, Inc., Centre National De La Recherche Scientifique, Commissariat a L'energie Atomique Et Aux Energies Alternatives. Active years: 2001-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Olivier Joubert. Retrieved from https://idiyas.com/inventor/olivier-joubert

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 30 

% Patents Active = 60.0

 

Average Co-Inventor Count = 4.7

ph-index = 8

Forward Citations = 255(Granted Patents)


Location History:

  • Brains, FR (2009 - 2017)
  • Meylan, FR (2001 - 2023)

Company Filing History:

goldMedal19 out of 14,502 
 
Applied Materials, Inc.
 patents
silverMedal9 out of 5,383 
 
Centre National De La Recherche Scientifique
 patents
bronzeMedal6 out of 8,836 
 
Commissariat a L'energie Atomique Et Aux Energies Alternatives
 patents
4. 2 out of 1,156 
 
France Telecom
 patents
5. 2 out of 112 
 
Université Joseph Fourier
 patents
6. 1 out of 429 
 
Electricite De France
 patents
7. 1 out of 182 
 
Université Grenoble Alpes
 patents
8. 2 out of 834,601 
Other
 patents
where one patent can have more than one assignee

Years Active: 2001-2026

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Areas of Expertise:
Ion Energy Distribution
Plasma Etching
Wafer Processing
Silicon Nitride
Microelectronic Method
Dielectric Material
Transistor Gate
Cyclic Oxide Spacer
Proton-Conducting Electrolyte
Resistive Device
Anisotropic Etching
Gate Manufacturing
30 patents (USPTO):Explore Patents
1. 12727409 - In-situ carbon liner for high aspect ratio features (2026-09-01),
2. 12620546 - Creating ion energy distribution functions (IEDF) (2026-05-05),
3. 12614700 - Minimization of ring erosion during plasma processes (2026-04-28),
4. 11728124 - Creating ion energy distribution functions (IEDF) (2023-08-15),
5. 11069504 - Creating ion energy distribution functions (IEDF) (2021-07-20),
6. 11049760 - Universal process kit (2021-06-29),
7. 10685807 - Creating ion energy distribution functions (IEDF) (2020-06-16),
8. 10312048 - Creating ion energy distribution functions (IEDF) (2019-06-04),
9. 10109464 - Minimization of ring erosion during plasma processes (2018-10-23),
10. 10062602 - Method of etching a porous dielectric material (2018-08-28),
11. 10056266 - Method for manufacturing a resistive device for a memory or logic circuit (2018-08-21),
12. 9975758 - Wafer processing equipment having exposable sensing layers (2018-05-22),
13. 9818621 - Cyclic oxide spacer etch process (2017-11-14),
14. D797691 - Composite edge ring (2017-09-19),
15. 9725302 - Wafer processing equipment having exposable sensing layers (2017-08-08),

Title: Olivier Joubert: A Visionary Innovator Shaping the Future

Introduction:

Olivier Joubert, a renowned inventor hailing from Meylan, FR, is a trailblazer in the field of technology. His relentless pursuit of innovation and excellence continues to inspire generations of inventors and visionaries worldwide.

Latest Patents:

With an impressive portfolio of 27 patents to his name, Olivier Joubert's latest groundbreaking work revolves around creating ion energy distribution functions (IEDF). His systems and methods enable the creation of arbitrarily-shaped ion energy distribution functions using shaped-pulse-bias, revolutionizing the semiconductor industry.

Career Highlights:

Having contributed his expertise to esteemed companies such as Applied Materials, Inc. and Commissariat a l'Energie Atomique Et Aux Energies Alternatives, Olivier Joubert has left an indelible mark on the technological landscape. His commitment to pushing the boundaries of innovation is evident in each of his patents.

Collaborations:

Throughout his illustrious career, Olivier Joubert has collaborated with top-notch professionals in the industry, including Olivier Luere and Nicolas Posseme. Together, they have spearheaded projects that have paved the way for novel technological advancements and breakthroughs.

Conclusion:

In conclusion, Olivier Joubert's passion for innovation coupled with his unwavering dedication to excellence serves as a beacon for aspiring inventors and visionaries. His contributions to the realm of technology have not only shaped the present but also hold the promise of a brighter and more innovative future for all.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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