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For the Inventor, By the Inventor

Meylan, France

Olivier Joubert

USPTO Granted Patents = 27 

 

Average Co-Inventor Count = 4.8

ph-index = 7

Forward Citations = 217(Granted Patents)


Location History:

  • Brains, FR (2009 - 2017)
  • Meylan, FR (2001 - 2023)

Company Filing History:

goldMedal16 out of 13,684 
 
Applied Materials, Inc.
 patents
silverMedal9 out of 5,069 
 
Centre National De La Recherche Scientifique
 patents
bronzeMedal6 out of 3,854 
 
Commissariat a L'energie Atomique Et Aux Energies Alternatives
 patents
4. 2 out of 1,156 
 
France Telecom
 patents
5. 2 out of 112 
 
Université Joseph Fourier
 patents
6. 1 out of 152 
 
Université Grenoble Alpes
 patents
7. 1 out of 251 
 
Electricite De France
 patents
8. 2 out of 832,680 
Other
 patents
where one patent can have more than one assignee

Years Active: 2001-2023

where 'Filed Patents' based on already Granted Patents

27 patents (USPTO):
1. 11728124 - Creating ion energy distribution functions (IEDF) (2023-08-15),
2. 11069504 - Creating ion energy distribution functions (IEDF) (2021-07-20),
3. 11049760 - Universal process kit (2021-06-29),
4. 10685807 - Creating ion energy distribution functions (IEDF) (2020-06-16),
5. 10312048 - Creating ion energy distribution functions (IEDF) (2019-06-04),
6. 10109464 - Minimization of ring erosion during plasma processes (2018-10-23),
7. 10062602 - Method of etching a porous dielectric material (2018-08-28),
8. 10056266 - Method for manufacturing a resistive device for a memory or logic circuit (2018-08-21),
9. 9975758 - Wafer processing equipment having exposable sensing layers (2018-05-22),
10. 9818621 - Cyclic oxide spacer etch process (2017-11-14),
11. D797691 - Composite edge ring (2017-09-19),
12. 9725302 - Wafer processing equipment having exposable sensing layers (2017-08-08),
13. 9601794 - Electrochemical device comprising a proton-conducting ceramic electrolyte (2017-03-21),
14. 9583339 - Method for forming spacers for a transistor gate (2017-02-28),
15. 9570317 - Microelectronic method for etching a layer (2017-02-14),

Title: Olivier Joubert: A Visionary Innovator Shaping the Future

Introduction:

Olivier Joubert, a renowned inventor hailing from Meylan, FR, is a trailblazer in the field of technology. His relentless pursuit of innovation and excellence continues to inspire generations of inventors and visionaries worldwide.

Latest Patents:

With an impressive portfolio of 27 patents to his name, Olivier Joubert's latest groundbreaking work revolves around creating ion energy distribution functions (IEDF). His systems and methods enable the creation of arbitrarily-shaped ion energy distribution functions using shaped-pulse-bias, revolutionizing the semiconductor industry.

Career Highlights:

Having contributed his expertise to esteemed companies such as Applied Materials, Inc. and Commissariat a l'Energie Atomique Et Aux Energies Alternatives, Olivier Joubert has left an indelible mark on the technological landscape. His commitment to pushing the boundaries of innovation is evident in each of his patents.

Collaborations:

Throughout his illustrious career, Olivier Joubert has collaborated with top-notch professionals in the industry, including Olivier Luere and Nicolas Posseme. Together, they have spearheaded projects that have paved the way for novel technological advancements and breakthroughs.

Conclusion:

In conclusion, Olivier Joubert's passion for innovation coupled with his unwavering dedication to excellence serves as a beacon for aspiring inventors and visionaries. His contributions to the realm of technology have not only shaped the present but also hold the promise of a brighter and more innovative future for all.

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