Tokyo, Japan

Norio Hirashita

This inventor holds 12 USPTO granted patents and 1 published patent application. Top assignees: Oki Electric Industry Co., Ltd., Kabushiki Kaisha Toshiba, Oki Semiconductor Co., Ltd.. Active years: 1994-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Norio Hirashita. Retrieved from https://idiyas.com/inventor/norio-hirashita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 12 

% Patents Active = 66.7

Average Co-Inventor Count = 2.3

ph-index = 5

Forward Citations = 97(Granted Patents)


Location History:

  • Higashi-yamato, JP (2005 - 2010)
  • Tokyo, JP (1994 - 2012)

Company Filing History:


Years Active: 1994-2012

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12 patents (USPTO):Explore Patents

Title: Norio Hirashita: Innovator in Semiconductor Technology

Introduction

Norio Hirashita is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 12 patents. His work has advanced the development of semiconductor devices, showcasing his expertise and innovative spirit.

Latest Patents

Hirashita's latest patents include groundbreaking inventions in semiconductor devices. One notable patent is for a semiconductor device that features a silicide layer completely occupying an amorphous layer formed in the substrate, along with an interface junction of (111) silicon plane. This invention includes diffusion layers formed in a Silicon-On-Insulator (SOI) layer under a side-wall, with a channel formed between the diffusion layers. The silicide layers sandwich the diffusion layers, wherein the interface junctions between the diffusion layers and the silicide layers are (111) silicon planes. Another significant patent is a method of manufacturing a semiconductor device, which involves preparing a substrate that includes a buried oxide film and a SiGe layer. The method outlines a series of heat treatments to form a protective oxide film and to enhance the Ge concentration in the SiGe layer.

Career Highlights

Throughout his career, Norio Hirashita has worked with notable companies in the semiconductor industry, including Oki Electric Industry Co., Ltd. and Kabushiki Kaisha Toshiba. His experience in these organizations has allowed him to refine his skills and contribute to various innovative projects.

Collaborations

Hirashita has collaborated with esteemed colleagues such as Takashi Ichimori and Naoharu Sugiyama. These partnerships have fostered a creative environment that has led to the development of advanced semiconductor technologies.

Conclusion

Norio Hirashita's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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