Company Filing History:

16 out of 10,295

Tokyo Electron Limited

Kabushiki Kaisha Toshiba

patents

where one patent can have more than one assignee

Years Active: 2009-2020

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16 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 10615005 - Plasma generating method (2020-04-07),

2. 10593519 - Plasma processing apparatus (2020-03-17),

3. 10388544 - Substrate processing apparatus and substrate processing method (2019-08-20),

4. 10250217 - Method for impedance matching of plasma processing apparatus (2019-04-02),

5. 10109461 - Plasma processing method (2018-10-23),

6. 10032611 - Connection control method (2018-07-24),

7. 9875881 - Plasma processing apparatus and plasma processing method (2018-01-23),

8. 9754768 - Plasma processing method and plasma processing apparatus (2017-09-05),

9. 9736921 - Method for impedance matching of plasma processing apparatus (2017-08-15),

10. 9734992 - Plasma processing apparatus (2017-08-15),

11. 9564287 - Substrate processing apparatus and substrate processing method using same (2017-02-07),

12. 9355822 - Plasma processing apparatus (2016-05-31),

13. 8821684 - Substrate plasma processing apparatus and plasma processing method (2014-09-02),

14. 8568606 - Substrate processing apparatus and substrate processing method using same (2013-10-29),

15. 8288286 - Dry-etching method (2012-10-16),

Title: **The Innovative Mind of Norikazu Yamada**

Introduction

Norikazu Yamada is a prominent inventor based in Miyagi, Japan, recognized for his contributions to the field of plasma technology. With an impressive portfolio of 16 patents, Yamada has significantly impacted the industry through his innovative approaches and groundbreaking methods.

Latest Patents

Yamada's latest patents include a method for generating plasma, where radio-frequency power is supplied to an electrode via a matching device from a radio-frequency power supply. This method involves monitoring parameters to ensure plasma generation within a chamber, adjusting the power frequency when necessary. Another notable patent is a plasma processing apparatus that optimizes the duty ratio of high-frequency power for precise control during etching processes. This innovation ensures reliable plasma ignition and effective processing throughout the operation.

Career Highlights

Throughout his career, Yamada has worked with esteemed organizations such as Tokyo Electron Limited and Daihen Corporation. His experience in these companies has allowed him to refine his skills and contribute to cutting-edge technological advancements in plasma processing.

Collaborations

Yamada has collaborated with talented professionals in the field, including Koichi Nagami and Toshifumi Tachikawa. Together, they have shared expertise and ideas that have propelled their projects forward, fostering a culture of innovation within their teams.

Conclusion

Norikazu Yamada stands out as a key figure in the realm of plasma technology. His innovative patents and collaborative spirit have not only advanced his career but have also contributed to the broader technological landscape. His work continues to inspire future inventors and researchers in Japan and around the world.

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