The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2017
Filed:
Dec. 05, 2012
Tokyo Electron Limited, Tokyo, JP;
Daihen Corporation, Osaka-shi, Osaka, JP;
Norikazu Yamada, Miyagi, JP;
Toshifumi Tachikawa, Miyagi, JP;
Koichi Nagami, Miyagi, JP;
Satoru Hamaishi, Osaka, JP;
Koji Itadani, Osaka, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
DAIHEN CORPORATION, Osaka-Shi, Osaka, JP;
Abstract
A plasma processing apparatus performs a stable and accurate matching operation with high reproducibility in a power modulation process of modulating of a high frequency power to be supplied into a processing vessel in a pulse shape. In the plasma processing apparatus, an impedance sensorA provided in a matching device performs a dual sampling averaging process on a RF voltage measurement value and an electric current measurement value respectively obtained from a RF voltage detectorA of a voltage sensor system and a RF electric current detectorA of an electric current sensor system by sampling-average-value calculating circuitsA andA and by moving-average-value calculating circuitsA andA. Thus, an update speed of a load impedance measurement value outputted from the impedance sensorA can be matched well with a driving control speed of a motor in a matching controller.