The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2016
Filed:
Dec. 13, 2012
Tokyo Electron Limited, Minato-ku, JP;
Daihen Corporation, Osaka-shi, Osaka, JP;
Norikazu Yamada, Miyagi, JP;
Toshifumi Tachikawa, Miyagi, JP;
Koichi Nagami, Miyagi, JP;
Tatsuya Ikenari, Osaka, JP;
Daisuke Maehara, Osaka, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
DAIHEN CORPORATION, Osaka, JP;
Abstract
In a capacitively coupled plasma processing apparatus, a susceptor (lower electrode)within a decompression chamberfaces an upper electrodeserving as a shower head. The susceptoris electrically connected with a first high frequency power supplyand a second high frequency power supplyvia matching devicesand, respectively. The first high frequency power supplyis formed of a linear amplifier type high frequency power supply and outputs a first high frequency power RFfor plasma generation. The second high frequency power supplyis formed of a switching type high frequency power supply and outputs a second high frequency power RFfor ion attraction. A residual high frequency power removing unitis connected to a high frequency power supply lineon a side of the second high frequency power supply