Company Filing History:
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Years Active: 2007-2016
Title: **Innovator Spotlight: Tatsuya Ikenari from Osaka, JP**
Introduction
Tatsuya Ikenari, a notable inventor based in Osaka, Japan, has made significant contributions to the field of plasma processing and high-frequency power supply technology. With a total of four patents to his name, Ikenari's innovations are paving the way for advancements in various applications.
Latest Patents
Ikenari's most recent patents include a "Plasma Processing Apparatus" and a "High Frequency Power Supply Device."
The "Plasma Processing Apparatus" involves a capacitively coupled plasma processing system where a susceptor, or lower electrode, faces an upper electrode that serves as a shower head. This intriguing design showcases a dual high-frequency power supply setup that enhances plasma generation and ion attraction. The apparatus effectively connects with a residual high-frequency power removing unit to optimize performance.
The "High Frequency Power Supply Device" features a high-frequency power generation unit that outputs power to a load, along with a control unit that detects and regulates the power levels. This advanced device incorporates a detection system for power change periods and adjusts accordingly to ensure consistent output.
Career Highlights
Throughout his career, Tatsuya Ikenari has worked with renowned companies, including Daihen Corporation and Tokyo Electron Limited. His experience in these organizations has undoubtedly enriched his expertise and innovation capabilities in the field of electrical engineering and plasma technology.
Collaborations
Ikenari has collaborated with notable colleagues, including Daisuke Maehara and Hiroyuki Kotani. These partnerships have likely fostered an innovative environment, enabling the exchange of ideas and technical expertise beneficial to their projects.
Conclusion
Overall, Tatsuya Ikenari is a prominent figure in the realm of technology and innovation. His patents reflect a deep understanding of complex systems and a commitment to advancing scientific knowledge. His contributions hold great promise for the future of plasma processing and high-frequency applications, making him an inventor to watch in the evolving landscape of technology.