Osaka, Japan

Daisuke Maehara

This inventor holds 2 USPTO granted patents. Top assignees: Daihen Corporation, Tokyo Electron Limited. Active years: 2014-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daisuke Maehara. Retrieved from https://idiyas.com/inventor/daisuke-maehara-dvhxb4vh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 61(Granted Patents)


Company Filing History:


Years Active: 2014-2016

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2 patents (USPTO):Explore Patents

Title: The Innovative Journey of Daisuke Maehara, Inventor from Osaka

Introduction

Daisuke Maehara is a distinguished inventor based in Osaka, Japan, known for his contributions to the field of plasma processing technology. With a total of two patents to his name, Maehara is recognized for his innovative designs that enhance the efficiency and effectiveness of plasma applications.

Latest Patents

Daisuke Maehara's most recent patents showcase his expertise in high frequency power technologies. His first patent, the "Plasma Processing Apparatus," features a capacitively coupled plasma processing apparatus that includes a susceptor and upper electrode serving as a shower head. This design allows for efficient power coupling through two distinct high frequency power supplies, supporting both plasma generation and ion attraction. Additionally, his second patent, the "High Frequency Power Supply Device," includes a high frequency power generation unit that monitors and adjusts power outputs based on load demand, ensuring optimal performance in various applications.

Career Highlights

Maehara has gained substantial experience working with prominent companies in the technology sector. Notably, he has held positions at Daihen Corporation and Tokyo Electron Limited, where he contributed to significant advancements in plasma processing technologies. His work has played a crucial role in improving the precision and reliability of plasma-related systems used in various manufacturing processes.

Collaborations

Throughout his career, Daisuke Maehara has collaborated with other talented professionals in the industry, including Tatsuya Ikenari and Norikazu Yamada. These collaborations have fostered an exchange of ideas and innovations that have influenced their projects and technological advancements.

Conclusion

Daisuke Maehara's journey as an inventor reflects his commitment to innovation in plasma processing technologies. His patents serve as a testament to his engineering capabilities and dedication to improving industrial processes. With ongoing collaboration and a focus on cutting-edge developments, Maehara continues to make significant strides in the field of technology from his base in Osaka, Japan.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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