Tokyo, Japan

Norihiko Ikeda

This inventor holds 24 USPTO granted patents and 6 published patent applications and 1 EPO patent, primarily in Plasma Processing. Top assignees: Jsr Corporation, Hitachi High-Tech Corporation, Hitachi-High-Technologies Corporation. Active years: 2007-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Norihiko Ikeda. Retrieved from https://idiyas.com/inventor/norihiko-ikeda

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 24 

% Patents Active = 87.5

 

Average Co-Inventor Count = 2.9

ph-index = 3

Forward Citations = 31(Granted Patents)


Location History:

  • Chuo-ku, JP (2007 - 2009)
  • Suzuka, JP (2012)
  • Hiroshima, JP (2016 - 2021)
  • Tokyo, JP (2007 - 2024)

Company Filing History:


Years Active: 2007-2025

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Areas of Expertise:
Plasma Processing Apparatus
Photoresist Composition
Chemical Mechanical Polishing
Resist Pattern-Forming Method
Radiation-Sensitive Resin
Acid Diffusion Control Agent
ECR Height Monitor
Sample Processing System
Polymer
Production Method
24 patents (USPTO):Explore Patents

Sure, I'd be happy to help you with that! Here is the article about inventor Norihiko Ikeda:

Title: Norihiko Ikeda: Pioneering Innovator in Tokyo

Introduction:

Norihiko Ikeda, a visionary inventor based in Tokyo, JP, has garnered a reputation for his relentless pursuit of technological advancement and passion for innovation. With a total of 20 patents under his belt, Ikeda's contributions to the field of technology have inspired a new generation of inventors and innovators.

Latest Patents:

Among his recent patents is the "Plasma Processing Apparatus", which revolutionizes plasma processing by efficiently removing charged particles on a wafer surface, achieving high verticality in trench shapes, and minimizing damage to unetched films within a trench. Additionally, the "Plasma Processing Apparatus and Plasma Processing Method" patent showcases Ikeda's ingenuity in optimizing radio frequency power sources for enhanced plasma generation.

Career Highlights:

Throughout his career, Norihiko Ikeda has made significant strides in technological advancements while working at renowned companies such as JSR Corporation and Hitachi High-Tech Corporation. His pioneering research and innovative approach have led to the development of cutting-edge technologies in the realm of plasma processing.

Collaborations:

Ikeda's success is also attributed to collaborations with esteemed colleagues, including Naoki Yasui and Hayato Namai. Together, they have pushed the boundaries of innovation, resulting in groundbreaking inventions and patents that have left a lasting impact on the technological landscape.

Conclusion:

In conclusion, Norihiko Ikeda's unwavering dedication to innovation and his remarkable contributions to the field of technology have solidified his position as a visionary inventor. His inventive spirit continues to shape the future of technological advancements, inspiring aspiring inventors and innovators worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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