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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9477149 B1

PDFFull Text
Date of Patent:
Oct. 25, 2016

Filed:

Sep. 19, 2014

Photoresist composition, compound, and production method thereof

Applicant:

Jsr Corporation, Minato-ku, JP;

Inventors:

Hayato Namai, Tokyo, JP;

Norihiko Ikeda, Tokyo, JP;

Takanori Kawakami, Tokyo, JP;

Assignee:

JSR CORPORATION, Minato-ku, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Anca Eoff

Int. Cl.
CPC ...
G03F 7/039 (2006.01); C07C 381/12 (2006.01); C07C 309/25 (2006.01); G03F 7/027 (2006.01); C07D 307/93 (2006.01); C07D 307/94 (2006.01); C07D 311/74 (2006.01); C07D 313/06 (2006.01); C07D 317/24 (2006.01); C07D 319/06 (2006.01); C07D 321/12 (2006.01); C07D 327/04 (2006.01); C07C 309/17 (2006.01); C07D 237/04 (2006.01); C07D 237/16 (2006.01); C07D 493/10 (2006.01); C07D 207/416 (2006.01); C07D 211/46 (2006.01); C07D 295/18 (2006.01); C07D 307/33 (2006.01); C07D 307/64 (2006.01); C07C 309/27 (2006.01); G03F 7/004 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01); G03F 7/038 (2006.01);
U.S. Cl.
CPC ...
G03F 7/027 (2013.01); C07C 309/17 (2013.01); C07C 309/27 (2013.01); C07C 381/12 (2013.01); C07D 207/416 (2013.01); C07D 211/46 (2013.01); C07D 237/04 (2013.01); C07D 237/16 (2013.01); C07D 295/18 (2013.01); C07D 307/33 (2013.01); C07D 307/64 (2013.01); C07D 307/93 (2013.01); C07D 307/94 (2013.01); C07D 311/74 (2013.01); C07D 313/06 (2013.01); C07D 317/24 (2013.01); C07D 319/06 (2013.01); C07D 321/12 (2013.01); C07D 327/04 (2013.01); C07D 493/10 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/038 (2013.01); G03F 7/0388 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/2041 (2013.01); C07C 2101/08 (2013.01); C07C 2101/10 (2013.01); C07C 2101/14 (2013.01); C07C 2101/18 (2013.01); C07C 2103/74 (2013.01);
Abstract

A photoresist composition containing (A) a polymer having a structural unit (I) that includes an acid-labile group, and (I) a compound represented by the following formula (1). In the following formula (1), R, R, Rand R represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. X represents a single bond, an oxygen atom or —NR—. Rrepresents a hydrogen atom, a hydroxy group or a monovalent organic group having 1 to 20 carbon atoms, and optionally taken together represents a ring structure by binding with R each other. Arepresents —SOor —CO. Mrepresents a monovalent onium cation.

Find Patent Forward Citations

Namai, Hayato. (2016). Photoresist composition, compound, and production method thereof (U.S. Patent No. 9477149). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9477149

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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