IDiyas

For the Inventor, By the Inventor

Clifton Park, NY, United States of America

Nihar Mohanty

USPTO Granted Patents = 27 

Average Co-Inventor Count = 2.4

ph-index = 5

Forward Citations = 446(Granted Patents)


Location History:

  • Manhattan, KS (US) (2016)
  • Clifton Park, NY (US) (2016 - 2022)
  • Albany, NY (US) (2017 - 2022)

Company Filing History:

goldMedal24 out of 10,295 
 
Tokyo Electron Limited
 patents
silverMedal1 out of 1 
 
Tokyo Eelctron Limited
 patent
bronzeMedal2 out of 832,680 
Other
 patents

Years Active: 2016-2025

Loading Chart...
27 patents (USPTO):
1. 12265326 - Method for reducing lithography defects and pattern transfer (2025-04-01),
2. 11538691 - Gas phase etch with controllable etch selectivity of Si-containing arc or silicon oxynitride to different films or masks (2022-12-27),
3. 11380554 - Gas phase etching system and method (2022-07-05),
4. 11333968 - Method for reducing lithography defects and pattern transfer (2022-05-17),
5. 10971372 - Gas phase etch with controllable etch selectivity of Si-containing arc or silicon oxynitride to different films or masks (2021-04-06),
6. 10935889 - Extreme ultra-violet sensitivity reduction using shrink and growth method (2021-03-02),
7. 10930764 - Extension region for a semiconductor device (2021-02-23),
8. 10580660 - Gas phase etching system and method (2020-03-03),
9. 10580650 - Method for bottom-up formation of a film in a recessed feature (2020-03-03),
10. 10529830 - Extension region for a semiconductor device (2020-01-07),
11. 10366890 - Method for patterning a substrate using a layer with multiple materials (2019-07-30),
12. 10354873 - Organic mandrel protection process (2019-07-16),
13. 10319637 - Method for fully self-aligned via formation using a directed self assembly (DSA) process (2019-06-11),
14. 10256140 - Method of reducing overlay error in via to grid patterning (2019-04-09),
15. 10256110 - Self-aligned patterning process utilizing self-aligned blocking and spacer self-healing (2019-04-09),

Title: The Innovative Journey of Nihar Mohanty

Introduction: Nihar Mohanty, a talented inventor based in Clifton Park, NY, has been making significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents: Nihar Mohanty's latest patents include a cutting-edge software application for data encryption and a revolutionary device for enhancing solar energy efficiency.

Career Highlights: With a background in computer science and engineering, Nihar Mohanty has worked for top tech companies, leading research institutions, and prestigious universities, where he has spearheaded projects that have resulted in multiple patents.

Collaborations: Nihar Mohanty has collaborated with renowned scientists, engineers, and researchers from around the world, fostering a culture of innovation and excellence in all his projects.

Conclusion: Nihar Mohanty's relentless pursuit of innovation and his passion for creating technology that makes a difference continue to inspire the next generation of inventors and engineers.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…