Albany, CA, United States of America

Nathan W Cheung

USPTO Granted Patents = 59 

Average Co-Inventor Count = 2.1

ph-index = 41

Forward Citations = 6,125(Granted Patents)

Forward Citations (Not Self Cited) = 6,016(Dec 10, 2025)


Inventors with similar research interests:


Company Filing History:


Years Active: 1999-2015

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Areas of Expertise:
Controlled Cleaving Process
Fluorescence-Detecting Microanalytical System
Gettering Technique
Silicon-on-Silicon Hybrid Wafer Assembly
Thin Film Separation
Plasma Immersion Ion Implantation
Wafer Edge Engineering
Patterned Films
Low Temperature Metal Bond
Cluster Tool System
Pre-Semiconductor Process
Beta Annealing
59 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Nathan W. Cheung - Pioneering Multi-Material Thin Film Technology

Introduction:

Nathan W. Cheung, based in Albany, CA, is a prolific inventor in the field of multi-material thin film technology. With an impressive portfolio of 59 patents, Cheung has made significant contributions to the advancement of innovative processes in the semiconductor industry.

Latest Patents:

Cheung's latest patents revolve around a controlled process for forming multi-material thin films. This method involves utilizing a multi-material donor substrate, energetic particles, and a controlled cleaving action to produce high-quality multi-material films consisting of single crystal silicon and GaN.

Career Highlights:

Throughout his career, Nathan W. Cheung has been associated with prominent organizations such as Silicon Genesis Corporation and the University of California. His expertise and innovative approach have helped drive advancements in thin film technologies, setting new standards in the industry.

Collaborations:

Cheung has had the privilege of collaborating with notable professionals in the field, including Francois J. Henley and Timothy David Sands. These collaborative efforts have led to groundbreaking research and development projects, further solidifying Cheung's reputation as a leading innovator in his field.

Conclusion:

In conclusion, Nathan W. Cheung's dedication to advancing multi-material thin film technology has not only resulted in a significant number of patents but has also positioned him as a key figure in the semiconductor industry. His innovative methods and collaborative spirit continue to inspire progress and drive innovation in this critical field.

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