Machida, Japan

Naomu Kitano

This inventor holds 22 USPTO granted patents and 3 published patent applications, primarily in Semiconductor Manufacturing. Top assignees: Canon Anelva Corporation, Canon Kabushiki Kaisha, Japan Display Inc.. Active years: 2010-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naomu Kitano. Retrieved from https://idiyas.com/inventor/naomu-kitano

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22 

% Patents Active = 86.4

Average Co-Inventor Count = 3.4

ph-index = 4

Forward Citations = 57(Granted Patents)


Location History:

  • Ichikawa, JP (2010 - 2012)
  • Machida, JP (2011 - 2014)
  • Kawasaki, JP (2013 - 2016)
  • Tokyo, JP (2010 - 2019)

Company Filing History:


Years Active: 2010-2019

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Areas of Expertise:
Dielectric Films
Semiconductor Device
Electronic Components
Manufacturing Method
Hafnium Oxynitride
Sputtering
Metal Gate
Nonvolatile Storage
Electrode Structure
Film Formation
Metal Nitride
High-k Dielectric
22 patents (USPTO):Explore Patents

Title: Innovations by Naomu Kitano: A Journey Through Patents and Collaborations

Introduction

Naomu Kitano, based in Machida, Japan, is a prolific inventor with a total of 22 patents to his name. His contributions primarily focus on advancements in manufacturing methods for electronic components and display devices. Kitano's work underscores the importance of innovation in the rapidly evolving technology landscape.

Latest Patents

Among his latest patents, one notable invention is a method for manufacturing display devices. This process involves forming an insulating layer that embeds a transistor on a substrate, followed by creating a first electrode that connects electrically with the transistor. The method further includes constructing a partition wall layer, an organic layer, and a second electrode, culminating in the formation of a sealing layer. A significant aspect of this invention is the film deposition step for the second electrode, which employs a controlled thickness to enhance the device's performance.

Another important patent discusses an electronic component manufacturing method aimed at minimizing trench opening reduction and metal film diffusion within a trench. This innovative process includes the formation of a first electrode layer inside a recess, creating an ultrathin barrier layer via plasma-nitriding, and placing a second electrode layer on top, showcasing Kitano's expertise in materials engineering and manufacturing techniques.

Career Highlights

Throughout his career, Naomu Kitano has worked with prominent companies such as Canon Anelva Corporation and Canon Kabushiki Kaisha. His tenure at these organizations has provided him the platform to develop innovative solutions that bridge the gap between theoretical research and practical application in electronic manufacturing.

Collaborations

Kitano has collaborated with talented colleagues, including Takashi Nakagawa and Toru Tatsumi. These partnerships have not only enriched his research but have also contributed to the broader field of electronic component production, fostering a collaborative environment focused on innovation and development.

Conclusion

Naomu Kitano's extensive work in the field of manufacturing methods for display devices and electronic components is a testament to his innovative spirit and dedication to advancing technology. With 22 patents to his name, his contributions continue to influence the electronics industry, showcasing the importance of collaboration and ingenuity in driving technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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