Location History:
- Osaka, JP (2000 - 2002)
- Hyogo-ken, JP (2001 - 2002)
- Hyogo, JP (1999 - 2005)
- Amagasaki, JP (2008)
- Nishinomiya, JP (2009 - 2012)
- Nirasaki, JP (2013 - 2014)
- Iwate, JP (2016)
Company Filing History:
10 out of 929 
9 out of 10,326 
2 out of 1,481 
Years Active: 1999-2016
Title: Muneo Harada: A Pioneer in Advanced Film Deposition Technologies
Introduction
Muneo Harada is an accomplished inventor based in Nishinomiya, Japan, renowned for his innovative contributions in the field of semiconductor manufacturing. With a portfolio of 22 patents, Harada has significantly advanced techniques in film deposition and semiconductor device fabrication. His work is highly regarded in the industry and continues to impact the development of cutting-edge technologies.
Latest Patents
Among his numerous innovations, Harada's latest patents include a "Method for depositing a film" and a "Method of manufacturing semiconductor device." The film deposition method involves accommodating an object in a process chamber where an insulating polymer film is deposited using a first source gas of acid anhydride and a second source gas of diamine. This process not only produces a high-quality insulating film but also includes steps for modifying the film to enhance its barrier function.
The semiconductor device manufacturing method outlines a sequence of critical steps that improve the efficiency and performance of electronic components. Key steps include creating a hole through the substrate, depositing an organic insulating film, and utilizing plasma technology for cleaning and filling conductive materials. These innovations are essential for producing advanced semiconductor devices with enhanced functionality.
Career Highlights
Muneo Harada's career includes significant contributions while working with leading companies such as Sumitomo Metal Industries and Tokyo Electron Limited. His experiences at these organizations have honed his expertise in patenting advanced manufacturing processes and have positioned him as a thought leader in the semiconductor industry.
Collaborations
Throughout his career, Harada has collaborated with notable professionals such as Toshiyuki Matsumoto and Yoshihiro Hirota. These partnerships have played a crucial role in the development of his patented technologies and further underscore the collaborative nature of innovation in the field.
Conclusion
Muneo Harada stands out as a prominent inventor whose patents have revolutionized film deposition techniques and semiconductor manufacturing processes. His dedication to innovation and collaboration continues to drive advancements in technology, ensuring his lasting impact on the industry. With 22 patents to his name, Harada's work exemplifies the spirit of invention, influencing future generations of inventors and engineers alike.