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For the Inventor, By the Inventor

Hsin-Chu, Taiwan

Mong-Song Liang

USPTO Granted Patents = 191

Average Co-Inventor Count = 3.0

ph-index = 29

Forward Citations = 2,618(Granted Patents)


Inventors with similar research interests:


Location History:

  • Cupertino, CA (US) (1994 - 1995)
  • Hsin-Chu, TW (1995 - 2015)
  • Taipei, TW (2002 - 2017)

Company Filing History:

goldMedal189 out of 40,635 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents
silverMedal1 out of 442 
 
Mosel Vitelic Corporation
 patents
bronzeMedal1 out of 832,680 
Other
 patents

Years Active: 1994-2017

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191 patents (USPTO):
1. 9564488 - Strained isolation regions (2017-02-07),
2. 9455344 - Integrated circuit metal gate structure having tapered profile (2016-09-27),
3. 9059310 - SRAM devices utilizing strained-channel transistors and methods of manufacture (2015-06-16),
4. 8932951 - Dishing-free gap-filling with multiple CMPs (2015-01-13),
5. 8803202 - Layout methods of integrated circuits having unit MOS devices (2014-08-12),
6. 8785272 - Process to make high-K transistor dielectrics (2014-07-22),
7. 8736016 - Strained isolation regions (2014-05-27),
8. 8735235 - Integrated circuit metal gate structure and method of fabrication (2014-05-27),
9. 8728900 - Integrating the formation of I/O and core MOS devices with MOS capacitors and resistors (2014-05-20),
10. 8716103 - Semiconductor device and method of fabricating same (2014-05-06),
11. 8669153 - Integrating a first contact structure in a gate last process (2014-03-11),
12. 8624295 - SRAM devices utilizing strained-channel transistors and methods of manufacture (2014-01-07),
13. 8564018 - Relaxed silicon germanium substrate with low defect density (2013-10-22),
14. 8552522 - Dishing-free gap-filling with multiple CMPs (2013-10-08),
15. 8461654 - Spacer shape engineering for void-free gap-filling process (2013-06-11),

Title: Mong-Song Liang: Innovating in the World of Semiconductor Technology

Introduction:

Mong-Song Liang, a distinguished inventor and innovator based in Hsin-Chu, Taiwan, has made significant contributions to the field of semiconductor technology. With 191 patents to his name, Liang has played a vital role in advancing various areas of integrated circuit design and manufacturing processes. This article delves into his latest patents, career highlights, notable collaborations, and recognition within the industry.

Latest Patents:

Liang's recent patents showcase his expertise in areas such as forming isolation trenches with localized stressors and designing integrated circuit metal gate structures with tapered profiles. In one of his latest inventions, Liang introduces a method for creating an isolation trench embedded with dielectric materials and localized stressors. This technique enhances the overall performance and reliability of integrated circuits by efficiently managing stress within the device structure. Another noteworthy invention presents a novel approach to designing metal gate structures with tapered profiles, offering improved performance and reduced power consumption.

Career Highlights:

Mong-Song Liang's professional journey has primarily unfolded at Taiwan Semiconductor Manufacturing Company Limited (TSMC), one of the world's leading semiconductor foundries. At TSMC, Liang has spearheaded numerous research and development projects while contributing substantially to the company's intellectual property portfolio. His expertise in process technology, device design, and advanced manufacturing techniques has led to significant advancements in the semiconductor industry.

Collaborations:

Throughout his career, Liang has collaborated with several accomplished individuals, including Chen-Jong Wang and Kong-Beng Thei. These collaborations have resulted in numerous technological breakthroughs and have contributed to the advancement of semiconductor design and manufacturing processes. By working alongside industry peers, Liang has fostered a collaborative spirit and contributed to a vibrant ecosystem of innovation.

Conclusion:

Mong-Song Liang's substantial patent portfolio and extraordinary contributions to the field of semiconductor technology make him a true luminary in the industry. His work has significantly impacted the advancement of integrated circuit design and manufacturing processes, driving innovation and enhancing performance in electronic devices. As the semiconductor landscape continues to evolve, one can expect Mong-Song Liang to remain at the forefront, spearheading pioneering inventions and pushing the boundaries of technological possibilities.

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