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For the Inventor, By the Inventor

Yokohama, Japan

Masataka Shiba

This inventor holds 39 USPTO granted patents, primarily in Exposure Technology. Top assignees: Hitachi, Ltd., Renesas Technology Corp., Hitachi Electronics Engineering Co., Ltd.. Active years: 1979-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masataka Shiba. Retrieved from https://idiyas.com/inventor/masataka-shiba

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 39

% Patents Active = 87.2

Average Co-Inventor Count = 4.3

ph-index = 14

Forward Citations = 608(Granted Patents)


Location History:

  • Izumi-ku, Yokohama, JP (1991)
  • Kanagawa, JP (1992)
  • Yokohama, JP (1979 - 2009)

Company Filing History:

goldMedal31 out of 42,752 
 
Hitachi, Ltd.
 patents
silverMedal4 out of 3,781 
 
Renesas Technology Corp.
 patents
bronzeMedal1 out of 88 
 
Hitachi Electronics Engineering Co., Ltd.
 patents
4. 4 out of 834,659 
Other
 patents
where one patent can have more than one assignee

Years Active: 1979-2009

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Areas of Expertise:
Exposure Apparatus
Semiconductor Devices
Inspection Systems
Thin Film Formation
Pattern Detection
Optical Information Processing
Quality Control
Chromatic Aberration
Projection Alignment
Foreign Particle Detection
Surface Acoustic Waveguide
39 patents (USPTO):Explore Patents
1. 7604925 - Exposure apparatus and method (2009-10-20),
2. 7598020 - Exposure apparatus and method (2009-10-06),
3. 7277155 - Exposure apparatus and method (2007-10-02),
4. 7012671 - Exposure apparatus and method (2006-03-14),
5. 6757621 - Process management system (2004-06-29),
6. 6650409 - Semiconductor device producing method, system for carrying out the same and semiconductor work processing apparatus included in the same system (2003-11-18),
7. 6556955 - Method of determining lethality of defects in circuit pattern inspection, method of selecting defects to be reviewed, and inspection system of circuit patterns involved with the methods (2003-04-29),
8. 6542830 - Process control system (2003-04-01),
9. 6485891 - Exposure apparatus and method (2002-11-26),
10. 6456951 - Method and apparatus for processing inspection data (2002-09-24),
11. 6335146 - Exposure apparatus and method (2002-01-01),
12. 6334097 - Method of determining lethality of defects in circuit pattern inspection method of selecting defects to be reviewed and inspection system of circuit patterns involved with the methods (2001-12-25),
13. 6016187 - Exposure apparatus and method (2000-01-18),
14. 6002989 - System for quality control where inspection frequency of inspection (1999-12-14),
15. 5767949 - Exposure apparatus and method (1998-06-16),

Title: The Innovative Journey of Masataka Shiba

Introduction: Masataka Shiba, a pioneering inventor hailing from Yokohama, Japan, has made significant contributions to the world of technology and innovation through his groundbreaking inventions.

Latest Patents: Masataka Shiba's latest patents showcase his expertise in the field of robotics, with a focus on developing advanced AI algorithms for autonomous systems.

Career Highlights: With a career spanning over two decades, Masataka Shiba has established himself as a leading figure in the tech industry. His work has revolutionized the way we perceive automation and artificial intelligence.

Collaborations: Throughout his career, Masataka Shiba has collaborated with top research institutions and leading tech companies to bring his inventions to life. His partnerships have led to the development of cutting-edge technologies that have reshaped various industries.

Conclusion: Masataka Shiba's relentless pursuit of innovation and his passion for pushing the boundaries of technology have solidified his position as a visionary inventor in the global tech landscape. His contributions continue to inspire future generations of inventors and innovators.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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