The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2009
Filed:
Apr. 29, 2005
Minori Noguchi, Yokohama, JP;
Yukio Kenbo, Yokohama, JP;
Yoshitada Oshida, Fujisawa, JP;
Masataka Shiba, Yokohama, JP;
Yasuhiro Yoshitaka, Yokohama, JP;
Makoto Murayama, Fujisawa, JP;
Minori Noguchi, Yokohama, JP;
Yukio Kenbo, Yokohama, JP;
Yoshitada Oshida, Fujisawa, JP;
Masataka Shiba, Yokohama, JP;
Yasuhiro Yoshitaka, Yokohama, JP;
Makoto Murayama, Fujisawa, JP;
Renesas Technology Corporation, Tokyo, JP;
Abstract
A production method of a semiconductor device which includes the steps of exposing a resist coated on a substrate of a semiconductor device by projecting a light pattern on the substrate of the semiconductor device, developing the resist exposed by the light pattern to form a wafer pattern with the resist, and etching the substrate on which the wafer pattern with the resist is formed. In the step of exposing the light pattern is formed by illuminating a mask with excimer laser light having an annular shape.