Company Filing History:
Years Active: 1994-2009
Title: The Innovative Contributions of Makoto Murayama
Introduction
Makoto Murayama is a prominent inventor based in Fujisawa, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 11 patents. His work has been instrumental in advancing production methods for semiconductor devices.
Latest Patents
Among his latest patents is an exposure apparatus and method that outlines a production method for semiconductor devices. This method includes steps for exposing a resist coated on a substrate by projecting a light pattern, developing the resist to form a wafer pattern, and etching the substrate. The exposure step utilizes excimer laser light with an annular shape to illuminate a mask. Another notable patent also focuses on a similar production method, where the light pattern is projected through an object lens and involves a phase shifter mask.
Career Highlights
Throughout his career, Makoto Murayama has worked with leading companies in the technology sector, including Hitachi, Ltd. and Renesas Technology Corporation. His experience in these organizations has allowed him to refine his expertise in semiconductor manufacturing processes.
Collaborations
Makoto has collaborated with notable colleagues such as Yoshitada Oshida and Minori Noguchi. These partnerships have contributed to the development of innovative technologies in the semiconductor field.
Conclusion
Makoto Murayama's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor device production.