The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 1996
Filed:
Apr. 29, 1994
Applicant:
Inventors:
Minori Noguchi, Yokohama, JP;
Yukio Kenbo, Yokohama, JP;
Yoshitada Oshida, Fujisawa, JP;
Masataka Shiba, Yokohama, JP;
Yasuhiro Yoshitaka, Yokohama, JP;
Makoto Murayama, Fujisawa, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ; G03B / ; G03B / ;
U.S. Cl.
CPC ...
355 53 ; 355 71 ; 355 77 ;
Abstract
An exposure apparatus and method wherein a mask is illuminated with light and light one of transmitted through and reflected from the illuminated mask is imaged onto a substrate. At least during imaging, transmission of light one of transmitted and reflected from the illuminated mask is partially inhibited. More particularly, a spatial filter is utilized for inhibiting at least a portion of O-order diffraction light.