Nirasaki, Japan

Masaru Sugimoto

This inventor holds 22 USPTO granted patents and 1 published patent application and 6 EPO patents, primarily in Plasma Processing. Top assignees: Tokyo Electron Limited, Fujikura Limited, Tokyo Electron Limi Ted. Active years: 1987-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masaru Sugimoto. Retrieved from https://idiyas.com/inventor/masaru-sugimoto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22 

% Patents Active = 81.8

 

Average Co-Inventor Count = 6.0

ph-index = 9

Forward Citations = 718(Granted Patents)


Location History:

  • Tokyo, JP (1987 - 1994)
  • Miyagi, JP (2017)
  • Nirasaki, JP (2008 - 2020)
  • Yamanashi, JP (2019 - 2020)
  • Hillsboro, OR (US) (2023)

Company Filing History:


Years Active: 1987-2023

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Areas of Expertise:
Dielectric Layer
Nano-Sheet Devices
Plasma Etching
Plasma Processing
Superconducting Wire
Oxide Superconductor
Fabrication Process
Electrical Conductor
Substituted YiBa
Cables and Coils
Processing Apparatus
Storage Medium
22 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Masaru Sugimoto

Introduction

Masaru Sugimoto is a prominent inventor based in Nirasaki, Japan, known for his significant contributions to the field of semiconductor technology. With a remarkable portfolio of 22 patents, Sugimoto has made strides in the development of advanced manufacturing processes for semiconductor devices.

Latest Patents

One of his latest patents is titled "Fabrication process flow of dielectric layer for isolation of nano-sheet devices on bulk silicon substrate." This invention outlines a method for manufacturing a semiconductor device that involves forming a support on a side surface of a stack extending from a substrate. The stack comprises a second sacrificial film, multiple first sacrificial films, and several silicon-containing films. The method includes removing the second sacrificial film to create a space filled with a dielectric film. Another notable patent is the "Plasma etching apparatus and method," which describes a plasma etching apparatus featuring a second electrode for supporting a target substrate. This apparatus includes a control system that allows for the modulation of RF power supply, enhancing the efficiency of plasma ignition and etching processes.

Career Highlights

Throughout his career, Masaru Sugimoto has worked with leading companies in the semiconductor industry, including Tokyo Electron Limited and Fujikura Limited. His experience in these organizations has contributed to his expertise in semiconductor manufacturing and innovation.

Collaborations

Sugimoto has collaborated with notable professionals in the field, including Akira Koshiishi and Noriyuki Kobayashi. These collaborations have further enriched his work and expanded the impact of his inventions.

Conclusion

Masaru Sugimoto's innovative contributions to semiconductor technology and his extensive patent portfolio highlight his role as a key figure in the industry. His work continues to influence advancements in manufacturing processes and equipment design.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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