The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 2014
Filed:
Oct. 04, 2007
Akira Koshiishi, Kofu, JP;
Noriyuki Kobayashi, Nirasaki, JP;
Shigeru Yoneda, Nirasaki, JP;
Kenichi Hanawa, Nirasaki, JP;
Shigeru Tahara, Nirasaki, JP;
Masaru Sugimoto, Nirasaki, JP;
Akira Koshiishi, Kofu, JP;
Noriyuki Kobayashi, Nirasaki, JP;
Shigeru Yoneda, Nirasaki, JP;
Kenichi Hanawa, Nirasaki, JP;
Shigeru Tahara, Nirasaki, JP;
Masaru Sugimoto, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
An upper electrode and a lower electrode are disposed opposite to each other in a process container configured to be vacuum-exhausted. The upper electrode is connected to a first RF power supply configured to apply a first RF power for plasma generation. The lower electrode is connected to a second RF power supply configured to apply a second RF power for ion attraction. The second RF power supply is provided with a controller preset to control the second RF power supply to operate in a power modulation mode that executes power modulation in predetermined cycles between a first power set to deposit polymers on a predetermined film on a wafer and a second power set to promote etching of the predetermined film on the wafer.