Shigeru Yoneda

Title: The Innovative Contributions of Shigeru Yoneda

Introduction

Shigeru Yoneda is a prominent inventor based in Yamanashi, Japan, known for his significant contributions to substrate processing technology. With a total of six patents to his name, Yoneda has made remarkable advancements in the field, focusing on methods and apparatuses that optimize substrate processing.

Latest Patents

Yoneda's latest patents include a substrate processing method and substrate processing apparatus. The substrate processing method involves several critical steps: firstly, a placement step where the substrate is placed on an electrostatic chuck maintained at a predetermined temperature. This is followed by a first attraction step where a first direct current (DC) voltage is applied to attract the substrate onto the chuck. The holding step ensures that this attraction is maintained, reducing the temperature difference between the chuck and the substrate to 30 degrees Celsius or less. Finally, a second attraction step applies a higher DC voltage to further secure the substrate.

Another notable invention is a plasma etching apparatus and method. This apparatus features a second electrode designed to support a target substrate and includes a second RF power supply unit for providing bias for ion attraction. Central to the design is the RF controller, which can switch between continuous mode and power modulation mode, enhancing the efficiency for plasma ignition and operation.

Career Highlights

Shigeru Yoneda works at Tokyo Electron Limited, a leading company in semiconductor manufacturing equipment and electronic components. His career has been marked by a commitment to innovation, continuously seeking new ways to improve substrate processing techniques through his patented technologies.

Collaborations

Throughout his career, Yoneda has worked collaboratively with talented individuals such as Akira Koshiishi and Noriyuki Kobayashi. These partnerships have enabled him to leverage diverse expertise, contributing to the development of his cutting-edge inventions.

Conclusion

Shigeru Yoneda’s work exemplifies the spirit of innovation in substrate processing technology. His latest patents not only showcase his inventiveness but also highlight the collaborative nature of research and development in the field. As technology continues to evolve, Yoneda’s contributions will undoubtedly play a crucial role in shaping the future of the industry.