Kenichi Hanawa

Title: **Innovator Spotlight: Kenichi Hanawa**

Introduction

Kenichi Hanawa is a distinguished inventor based in Yamanashi, Japan, recognized for his impactful contributions to the field of plasma technology. With a total of three patents to his name, Hanawa’s innovative work continues to influence advancements in plasma etching techniques.

Latest Patents

Among his latest innovations are two notable patents for plasma etching apparatuses and methods. The first patent describes a plasma etching apparatus that includes a second electrode designed to support a target substrate, a second RF power supply unit for ion attraction, and an advanced control system with an RF controller. This controller is engineered to switch between continuous and power modulation modes, facilitating efficient plasma ignition and enhanced performance.

The second patent also focuses on a plasma etching apparatus featuring a first RF power supply for plasma generation and a second RF power supply for ion attraction. The apparatus is designed to operate in a power modulation mode that synchronizes the power modulation with the matching operation, allowing for refined etching processes.

Career Highlights

Kenichi Hanawa is currently employed at Tokyo Electron Limited, a company renowned for its cutting-edge semiconductor manufacturing equipment. His work in this advanced technology field underscores a commitment to innovation and excellence.

Collaborations

Throughout his career, Hanawa has collaborated with notable colleagues, including Akira Koshiishi and Noriyuki Kobayashi. These partnerships have fostered a synergistic environment that has propelled their collective advancements in plasma technologies.

Conclusion

Kenichi Hanawa's contributions through his patents and collaborations mark him as a key player in the innovations surrounding plasma etching technology. His work not only signifies his prowess as an inventor but also highlights the importance of collaboration in fostering technological advancements.