Manabu Iwata

Title: Manabu Iwata: Innovating Plasma Processing Technologies

Introduction

Manabu Iwata, based in Nirasaki, Japan, is a prolific inventor with an impressive portfolio of 29 patents. His work has significantly impacted the field of plasma processing, showcasing innovative approaches to enhance technological efficiency.

Latest Patents

Iwata's latest contributions to technology include groundbreaking patents such as the "Plasma Processing Apparatus and Measurement Method." This invention features a chamber housing a substrate support, an electric path, and a measuring device. The clever design allows the measuring device to assess electrical characteristic values of an edge ring, demonstrating a correlation with the thickness of the edge ring.

Another notable patent is the "Plasma Processing Apparatus and Method," which outlines a refined etching process. This method entails supplying an etching gas to a process container and applying RF power for both plasma generation and ion attraction. The process is enhanced by utilizing a negative DC voltage to optimize self-bias on the upper electrode during etching, thus improving efficiency.

Career Highlights

Manabu Iwata serves at Tokyo Electron Limited, a leader in the semiconductor manufacturing equipment industry. His career reflects a commitment to advancing technology through innovative plasma processing solutions, significantly benefiting the electronics sector.

Collaborations

Iwata has collaborated with esteemed colleagues such as Chishio Koshimizu and Naoki Matsumoto. Their combined expertise has fostered a collaborative environment that encourages groundbreaking advancements in plasma technology.

Conclusion

Manabu Iwata's extensive patent portfolio and his role at Tokyo Electron Limited underline his importance in the field of plasma processing. His innovative inventions pave the way for future advancements, reflecting a commitment to pushing the boundaries of technology in semiconductor manufacturing.