The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2013
Filed:
Feb. 23, 2012
Naoki Matsumoto, Amagasaki, JP;
Chishio Koshimizu, Nirasaki, JP;
Yoshinobu Hayakawa, Nirasaki, JP;
Hidetoshi Hanaoka, Nirasaki, JP;
Manabu Iwata, Nirasaki, JP;
Satoshi Tanaka, Nirasaki, JP;
Naoki Matsumoto, Amagasaki, JP;
Chishio Koshimizu, Nirasaki, JP;
Yoshinobu Hayakawa, Nirasaki, JP;
Hidetoshi Hanaoka, Nirasaki, JP;
Manabu Iwata, Nirasaki, JP;
Satoshi Tanaka, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
In a plasma processing apparatus, a first electrode is attached to a grounded evacuable processing chamber via an insulating material or a space and a second electrode disposed in parallel with the first electrode spaced apart therefrom in the processing chamber, the second electrode supporting a target substrate to face the first electrode. A first radio frequency power supply unit applies a first radio frequency power of a first frequency to the second electrode, and a second radio frequency power supply unit applies a second radio frequency power of a second frequency lower than the first frequency to the second electrode. Further, a processing gas supply unit supplies a processing gas to a processing space formed by the first and the second electrode and a sidewall of the processing chamber. Moreover, an inductor electrically is connected between the first electrode and a ground potential.