This inventor holds 22 USPTO granted patents and 2 published patent applications and 5 EPO patents, primarily in Plasma Processing. Top assignees: Tokyo Electron Limited, Tokyo Electron Limi Ted. Active years: 2011-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Yamanashi, JP (2015)
- Kurokawa-gun, JP (2016)
- Nirasaki, JP (2011 - 2020)
- Miyagi, JP (2016 - 2024)
Company Filing History:
Years Active: 2011-2026
Areas of Expertise:
Introduction
Hidetoshi Hanaoka, based in Nirasaki, Japan, is a prominent inventor with a remarkable portfolio of 21 patents. His groundbreaking work primarily focuses on plasma processing technologies, which are crucial in various industries, especially in semiconductor manufacturing.
Latest Patents
Hanaoka's latest innovations include a plasma processing apparatus and a plasma processing method. In his patent, he describes a sophisticated substrate support system that utilizes an electrostatic chuck designed to hold an edge ring. This electrostatic chuck is equipped with two electrodes that can be adjusted to different potentials during different stages of the plasma processing. Such advancements ensure improved efficiency and effectiveness during the processing of substrates.
His innovative plasma processing apparatus also features a processing vessel containing both a first member inside the vessel and a second member positioned outside of it. This configuration includes a gas flow passage that facilitates the movement of gas into the gap between these two members, a design that optimizes the processing environment for better results.
Career Highlights
Hidetoshi Hanaoka is affiliated with Tokyo Electron Limited, a company renowned for its contributions to the semiconductor production equipment domain. His inventive contributions have played a vital role in enhancing the functionality and performance of plasma processing technologies, which are fundamental in the production of advanced electronic devices.
Collaborations
Throughout his career, Hanaoka has collaborated with esteemed colleagues like Manabu Iwata and Chishio Koshimizu. Working alongside such talented professionals has fueled his innovation pursuits, leading to significant advancements in their field.
Conclusion
With 21 patents to his name, Hidetoshi Hanaoka continues to push the boundaries of innovation in plasma processing technology. His contributions not only reflect his inventive spirit but also reinforce Tokyo Electron Limited's position as a leader in the semiconductor manufacturing industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile