St. Louis, MO, United States of America

Lu Fei

USPTO Granted Patents = 12 

 

Average Co-Inventor Count = 3.5

ph-index = 4

Forward Citations = 104(Granted Patents)


Location History:

  • St. Louis, MO (US) (2001 - 2019)
  • San Francisco, CA (US) (2021 - 2023)

Company Filing History:


Years Active: 2001-2023

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12 patents (USPTO):Explore Patents

Title: Inventor Spotlight: Lu Fei - Pioneering Advancements in Semiconductor Technology

Introduction

Lu Fei, based in St. Louis, MO, is an accomplished inventor with an impressive portfolio of 12 patents. Her work primarily centers around semiconductor technology, pushing the boundaries of innovation in this crucial field.

Latest Patents

Among her latest innovations, Lu Fei has developed a high resistivity semiconductor-on-insulator wafer and a method of manufacture. This invention features a multilayer structure that comprises a high resistivity single crystal semiconductor handle substrate, an optionally relaxed semiconductor layer made from silicon, germanium, or silicon germanium, along with an optional polycrystalline silicon layer, a dielectric layer, and a single crystal semiconductor device layer. This technology represents a significant advancement in the production and functionality of semiconductor devices.

Career Highlights

Lu Fei's professional journey includes significant contributions to esteemed companies such as MEMC Electronic Materials, Inc. and GlobalWafers Co., Ltd. Her experience in these organizations has equipped her with a profound understanding of semiconductor materials and manufacturing processes.

Collaborations

Throughout her career, Lu Fei has had the opportunity to collaborate with talented professionals, including coworkers Jeffrey Louis Libbert and Joseph C. Holzer. These partnerships have enhanced her innovative work and contributed to her success as a leading inventor in her field.

Conclusion

With her extensive knowledge and groundbreaking patents, Lu Fei continues to make remarkable advancements in semiconductor technology. Her dedication to innovation not only benefits the industry but also inspires future generations of inventors.

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