The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 2013

Filed:

Feb. 04, 2011
Applicants:

John A. Pitney, St. Peters, MO (US);

Ichiro Yoshimura, Utsunomiya, JP;

LU Fei, St. Louis, MO (US);

Inventors:

John A. Pitney, St. Peters, MO (US);

Ichiro Yoshimura, Utsunomiya, JP;

Lu Fei, St. Louis, MO (US);

Assignee:

MEMC Electronic Materials, Inc., St. Peters, MO (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/78 (2006.01);
U.S. Cl.
CPC ...
Abstract

The disclosure relates to preparation of silicon on insulator structures with reduced unbonded regions and to methods for producing such wafers by minimizing the roll-off amount (ROA) of the handle and donor wafers. Methods for polishing wafers are also provided.


Find Patent Forward Citations

Pitney, John. (2013). Methods for reducing the width of the unbonded region in soi structures (U.S. Patent No. 8440541). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8440541

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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