Liyang Zhang

Title: Liyang Zhang: A Pioneer in Semiconductor Innovations

Introduction

Liyang Zhang is an accomplished inventor based in Suzhou, China, renowned for his significant contributions to the semiconductor industry. With a total of seven patents to his name, Zhang has been at the forefront of developing innovative semiconductor structures and manufacturing techniques that enhance performance and efficiency.

Latest Patents

One of Liyang Zhang's latest patents revolves around "Semiconductor structures and manufacturing methods thereof." This invention delineates a semiconductor structure comprising a first group III nitride epitaxial layer adhered to a silicon substrate with the aid of a bonding layer. It also introduces through-silicon-vias in the silicon substrate, ensuring communication with first through-holes in the bonding layer. The second group III nitride epitaxial layer is strategically positioned within these holes and vias, thus coupled with the first epitaxial layer, contributing to overall performance enhancements.

Another noteworthy patent details the "Manufacturing method of a semiconductor structure," which outlines a process involving the formation of an amorphous layer on a substrate. This layer features patterns that expose parts of the substrate, followed by the application of a metal nitride layer. The method systematically removes the amorphous layer to carve out cavities, ultimately leading to the development of the improved semiconductor structure. This innovative approach helps mitigate slip or dislocation during epitaxial growth, thereby enhancing the quality and performance of the resulting semiconductor.

Career Highlights

Liyang Zhang is currently employed at Enkris Semiconductor, Inc., a company that has gained recognition for its cutting-edge technologies in the semiconductor market. His role at Enkris has allowed him to push the boundaries of semiconductor technology further, contributing to the evolution of efficient manufacturing techniques.

Collaborations

Throughout his career, Zhang has collaborated with several professionals, including his coworker Kai Cheng. These partnerships have fostered an environment of innovation, enabling Zhang to bring forth groundbreaking ideas and solutions in semiconductor development.

Conclusion

Liyang Zhang's work in the realm of semiconductor structures and manufacturing methods reflects his dedication to advancing technology in the semiconductor field. With his innovative patents and contributions, he continues to influence the industry, paving the way for future developments that promise to revolutionize how semiconductors are designed and manufactured.