Lily L Pang

USPTO Granted Patents = 19 (Patent Applications = 1)

Average Co-Inventor Count = 4.8

ph-index = 9

Forward Citations = 819(Granted Patents)

Company Filing History:

18 out of 13,684

Applied Materials, Inc.

Years Active: 2000-2016

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19 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 9303318 - Multiple complementary gas distribution assemblies (2016-04-05),

2. 8568529 - HVPE chamber hardware (2013-10-29),

3. 8491720 - HVPE precursor source hardware (2013-07-23),

4. 8317970 - Ceiling electrode with process gas dispersers housing plural inductive RF power applicators extending into the plasma (2012-11-27),

5. D664172 - Dome assembly for a deposition chamber (2012-07-24),

6. 8183132 - Methods for fabricating group III nitride structures with a cluster tool (2012-05-22),

7. 7691755 - Plasma immersion ion implantation with highly uniform chamber seasoning process for a toroidal source reactor (2010-04-06),

8. 7520939 - Integrated bevel clean chamber (2009-04-21),

9. 7497026 - Method and system for detection of wafer centering in a track lithography tool (2009-03-03),

10. 7285195 - Electric field reducing thrust plate (2007-10-23),

11. 7223323 - Multi-chemistry plating system (2007-05-29),

12. 6958098 - Semiconductor wafer support lift-pin assembly (2005-10-25),

13. 6572708 - Semiconductor wafer support lift-pin assembly (2003-06-03),

14. 6517634 - Chemical vapor deposition chamber lid assembly (2003-02-11),

15. 6486081 - Gas distribution system for a CVD processing chamber (2002-11-26),

Title: Innovator Spotlight: Lily L Pang, Pioneer in Gas Distribution Technology

Introduction:

Lily L Pang, a prominent inventor based in Fremont, CA, is known for her groundbreaking work in gas distribution technology. With an impressive portfolio of 19 patents, she has made significant contributions to the field of semiconductor manufacturing. Let's delve into her latest patents, career highlights, and collaborations.

Latest Patents:

1. Multiple Complementary Gas Distribution Assemblies: One of Lily L Pang's recent inventions involves the development of gas distribution assemblies with complementary radial film growth rate profiles. These assemblies are designed to introduce different process gases into a processing chamber, enabling precise control over film deposition processes.

2. HVPE Chamber Hardware: Another noteworthy patent by Lily L Pang pertains to an HVPE chamber that allows for the separate deposition of two layers using distinct precursor sources. This innovative chamber design enhances the deposition of materials like gallium nitride and aluminum nitride onto substrates with minimal deposition on chamber walls.

Career Highlights:

Throughout her career, Lily L Pang has garnered experience working with esteemed companies such as Applied Materials, Inc., and Sokudo Co., Ltd. Her expertise in semiconductor manufacturing and gas distribution technologies has been instrumental in advancing the industry's capabilities.

Collaborations:

Lily L Pang has collaborated with accomplished professionals in the field, including Tetsuya Ishikawa and Son Truong Nguyen. Together, they have worked on innovative projects that have pushed the boundaries of gas distribution and semiconductor processing technologies.

Conclusion:

In conclusion, Lily L Pang stands out as a trailblazer in the realm of gas distribution technology. Her inventive spirit and collaborative approach have led to the development of groundbreaking solutions that have transformed semiconductor manufacturing processes. With a rich portfolio of patents and a history of successful collaborations, Lily L Pang continues to inspire innovation in the industry.

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1 patent pending:

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