The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7497026 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 03, 2009

Filed:

Jun. 14, 2007
Applicants:

Harald Herchen, Los Altos, CA (US);

Lily Pang, Fremont, CA (US);

Erica Porras, Los Gatos, CA (US);

Inventors:

Harald Herchen, Los Altos, CA (US);

Lily Pang, Fremont, CA (US);

Erica Porras, Los Gatos, CA (US);

Assignee:

Sokudo Co., Ltd., Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); G01B 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system for measuring substrate concentricity includes a substrate support member adapted to rotate a substrate around a substantially vertical axis. The substrate includes a mounting surface and a process surface. The system also includes a spin cup positioned below the substrate and a translatable arm mounted a predetermined distance above the process surface of the substrate. The translatable arm is adapted to translate along a radius of the substrate. The system further includes an optical emitter mounted on the translatable arm and an optical detector mounted on the translatable arm.


Find Patent Forward Citations

Herchen, Harald. (2009). Method and system for detection of wafer centering in a track lithography tool (U.S. Patent No. 7497026). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7497026

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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