The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2007
Filed:
Jun. 24, 2004
Harald Herchen, Los Altos, CA (US);
Dmitry Lubomirsky, Cupertino, CA (US);
BO Zheng, Saratoga, CA (US);
Lily L. Pang, Fremont, CA (US);
Harald Herchen, Los Altos, CA (US);
Dmitry Lubomirsky, Cupertino, CA (US);
Bo Zheng, Saratoga, CA (US);
Lily L. Pang, Fremont, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method and apparatus for an electrochemical processing cell that is configured to minimize bevel and backside deposition. The apparatus includes a contact ring assembly for supporting a substrate, a thrust plate movably positioned to engage a substrate positioned on the contact pins, and a lip seal member positioned to contact the thrust plate and the contact ring to prevent fluid flow therebetween. The lip seal includes at least one bubble release channel formed therethrough. The method includes positioning an electric field barrier between a backside substrate engaging member and a frontside substrate supporting member to prevent electric field from traveling to the bevel and backside of the substrate. The electric field barrier including at least one bubble release channel formed therethrough.