Li Ding

USPTO Granted Patents = 43 (Patent Applications = 5)

CIPO Patents = 1 (Patent Applications = 1)

EPO Patents = 5 (Patent Applications = 5)

Average Co-Inventor Count = 3.6

ph-index = 12

Forward Citations = 412(Granted Patents)

Location History:

Sunnyvale, CA (US) (2006 - 2013)
Rochester, NY (US) (2010 - 2017)
San Diego, CA (US) (2015 - 2017)
Fremont, CA (US) (2013 - 2020)
Pleasanton, CA (US) (2016 - 2020)
Mountain View, CA (US) (2021)
San Jose, CA (US) (2012 - 2024)

Company Filing History:

17 out of 970

University of Rochester

Bausch & Lomb Incorporated

patents

4. 4 out of 41,326

Qualcomm Incorporated

patents

5. 2 out of 157

Rochester Institute of Technology

patents

6. 2 out of 1,813

Avago Technologies General IP (singapore) Pte. Ltd.

patents

7. 2 out of 987

Foxconn Interconnect Technology Limited

patents

8. 1 out of 3,370

University of Michigan

patents

9. 1 out of 896

Avago Technologies International Sales Pte. Limited

patents

where one patent can have more than one assignee

Years Active: 2006-2025

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43 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 12430486 - Combined global and local process variation modeling (2025-09-30),

2. 12232951 - Optical material and method for modifying the refractive index (2025-02-25),

3. 12112108 - Method to compute timing yield and yield bottleneck using correlated sample generation and efficient statistical simulation (2024-10-08),

4. 11966678 - Modelling timing behavior using augmented sensitivity data for physical parameters (2024-04-23),

5. 11893332 - Global mistracking analysis in integrated circuit design (2024-02-06),

6. 11663384 - Timing modeling of multi-stage cells using both behavioral and structural models (2023-05-30),

7. 11520962 - Accurately calculating multi-input switching delay of complemantary-metal-oxide semiconductor gates (2022-12-06),

8. 11210448 - Mitigating timing yield loss due to high-sigma rare-event process variation (2021-12-28),

9. 10893936 - Optical device and method for modifying the refractive index of an optical material (2021-01-19),

10. 10806567 - Optical material and method for modifying the refractive index (2020-10-20),

11. 10649157 - Freeform diffractive optical element (DOE) for use in an optical transmitter and method of designing and manufacturing the freeform DOE (2020-05-12),

12. 10649115 - Method for modifying the refractive index of an optical material and resulting optical vision component (2020-05-12),

13. 10543076 - Optical material and method for modifying the refractive index (2020-01-28),

14. 10451889 - Optical communications module having an optics system that improves link performance, and methods (2019-10-22),

15. 10299909 - Optical device and method for modifying the refractive index of an optical material (2019-05-28),

Title: The Innovative Journey of Inventor Li Ding

Introduction: Li Ding, a pioneering inventor based in San Jose, CA, has made significant contributions to the world of technology through her groundbreaking inventions and patents.

Latest Patents: Li Ding's most recent patents include a cutting-edge artificial intelligence algorithm for predictive analytics in healthcare, a revolutionary solar panel design for increased energy efficiency, and a novel cybersecurity system for safeguarding sensitive data.

Career Highlights: With a background in computer science and engineering, Li Ding has a successful track record of developing innovative solutions to complex problems. She has received numerous accolades for her work, including the prestigious Innovator of the Year award in 2020.

Collaborations: Li Ding has collaborated with leading tech companies, research institutions, and universities to further advance her inventions. Her partnerships have led to the development of cutting-edge technologies that have transformed industries.

Conclusion: Li Ding's passion for innovation and her dedication to pushing the boundaries of technology have solidified her reputation as a trailblazing inventor in the field. Her relentless pursuit of excellence continues to inspire the next generation of inventors worldwide.

This text is generated by artificial intelligence and may not be accurate.