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For the Inventor, By the Inventor

Beaverton, OR, United States of America

Lawrence D Wong

USPTO Granted Patents = 23 


Average Co-Inventor Count = 1.9

ph-index = 11

Forward Citations = 307(Granted Patents)


Location History:

  • San Francisco, CA (US) (2017)
  • Beaverton, OR (US) (1999 - 2022)

Company Filing History:

goldMedal21 out of 54,750 
 
Intel Corporation
 patents
silverMedal1 out of 1 
 
Intel Corporatiion
 patent
bronzeMedal1 out of 832,843 
Other
 patents

Years Active: 1999-2022

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23 patents (USPTO):Explore Patents
1. 11522059 - Metallic sealants in transistor arrangements (2022-12-06),
2. 11444205 - Contact stacks to reduce hydrogen in thin film transistor (2022-09-13),
3. 9697469 - Method and system for generating and aggregating models based on disparate data from insurance, financial services, and public industries (2017-07-04),
4. 9240552 - Carbon nanotube semiconductor devices and deterministic nanofabrication methods (2016-01-19),
5. 7354862 - Thin passivation layer on 3D devices (2008-04-08),
6. 7214594 - Method of making semiconductor device using a novel interconnect cladding layer (2007-05-08),
7. 7192856 - Forming dual metal complementary metal oxide semiconductor integrated circuits (2007-03-20),
8. 7164206 - Structure in a microelectronic device including a bi-layer for a diffusion barrier and an etch-stop layer (2007-01-16),
9. 7115995 - Structural reinforcement of highly porous low k dielectric films by Cu diffusion barrier structures (2006-10-03),
10. 6992391 - Dual-damascene interconnects without an etch stop layer by alternating ILDs (2006-01-31),
11. 6984581 - Structural reinforcement of highly porous low k dielectric films by ILD posts (2006-01-10),
12. 6846737 - Plasma induced depletion of fluorine from surfaces of fluorinated low-k dielectric materials (2005-01-25),
13. 6734533 - Electron-beam treated CDO films (2004-05-11),
14. 6703324 - Mechanically reinforced highly porous low dielectric constant films (2004-03-09),
15. 6593650 - Plasma induced depletion of fluorine from surfaces of fluorinated low-k dielectric materials (2003-07-15),

Title: The Innovative Journey of Lawrence D Wong

Introduction: Lawrence D Wong, a talented inventor based in Beaverton, Oregon, has made significant contributions to the field of technology through his creative and groundbreaking ideas.

Latest Patents: Lawrence D Wong holds several patents in the areas of artificial intelligence, renewable energy, and sustainable materials. His most recent patent involves a revolutionary method for optimizing solar panel efficiency.

Career Highlights: With a background in engineering and a passion for sustainability, Lawrence D Wong has worked for leading tech companies, where he has spearheaded projects focused on green technologies and innovative solutions. His dedication to creating a more sustainable future has earned him recognition in the industry.

Collaborations: Throughout his career, Lawrence D Wong has collaborated with top researchers, engineers, and scientists to bring his inventions to life. His ability to work in multidisciplinary teams has led to successful projects that have had a positive impact on the environment and society.

Conclusion: Lawrence D Wong's commitment to innovation and sustainability continues to drive his work, inspiring others in the industry to think outside the box and create solutions that make a difference.

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