IDiyas

For the Inventor, By the Inventor

Hsin-Chu, Taiwan

Kuo-Liang Lu

USPTO Granted Patents = 19

Average Co-Inventor Count = 3.8

ph-index = 12

Forward Citations = 934(Granted Patents)


Company Filing History:

goldMedal19 out of 40,635 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents

Years Active: 1998-2025

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19 patents (USPTO):
1. 12211737 - Cleaning chamber for metal oxide removal (2025-01-28),
2. 7009772 - High transmittance overcoat for microlens arrays in semiconductor color imagers (2006-03-07),
3. 6926818 - Method to enhance the adhesion between dry film and seed metal (2005-08-09),
4. 6878642 - Method to improve passivation openings by reflow of photoresist to eliminate tape residue (2005-04-12),
5. 6821810 - High transmittance overcoat for optimization of long focal length microlens arrays in semiconductor color imagers (2004-11-23),
6. 6796315 - Method to remove particulate contamination from a solution bath (2004-09-28),
7. 6671396 - Method to monitor stepper lens quality in color filter process (2003-12-30),
8. 6623912 - Method to form the ring shape contact to cathode on wafer edge for electroplating in the bump process when using the negative type dry film photoresist (2003-09-23),
9. 6590239 - Color filter image array optoelectronic microelectronic fabrication with a planarizing layer formed upon a concave surfaced color filter region (2003-07-08),
10. 6586322 - Method of making a bump on a substrate using multiple photoresist layers (2003-07-01),
11. 6531266 - Rework procedure for the microlens element of a CMOS image sensor (2003-03-11),
12. 6495813 - Multi-microlens design for semiconductor imaging devices to increase light collection efficiency in the color filter process (2002-12-17),
13. 6482331 - Method for preventing contamination in a plasma process chamber (2002-11-19),
14. 6468704 - Method for improved photomask alignment after epitaxial process through 90° orientation change (2002-10-22),
15. 6417022 - Method for making long focal length micro-lens for color filters (2002-07-09),

Title: Innovator Spotlight: Kuo-Liang Lu

Introduction

Kuo-Liang Lu, an accomplished inventor based in Hsin-Chu, Taiwan, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of 19 patents, he continues to push the boundaries of innovation in his area of expertise.

Latest Patents

Kuo-Liang Lu's latest inventions showcase his commitment to advancing semiconductor processes. One of his notable patents is for a "Cleaning Chamber for Metal Oxide Removal." This invention revolves around a method that involves forming a dielectric layer over a conductive structure on a substrate. In this process, a cleaning chamber facilitates the removal of a portion of the dielectric layer, thereby cleaning the exposed conductive structure using a combination of noble gas and oxygen sources along with plasma formation.

Another significant patent is for a "High Transmittance Overcoat for Microlens Arrays in Semiconductor Color Imagers." This innovation features a transmittance overcoat designed to improve the performance and focal length of microlenses used in semiconductor array color imaging devices. The adaptive process described in the patent enables real-time compensation for variations, aiming to streamline the manufacturing of cost-effective CMOS and CCD color video cameras.

Career Highlights

Kuo-Liang Lu is affiliated with Taiwan Semiconductor Manufacturing Company Ltd., where his expertise in semiconductor processes has been instrumental in the development of cutting-edge technologies. His dedication to innovation has placed him at the forefront of advancements in the semiconductor industry.

Collaborations

Throughout his career, Kuo-Liang Lu has collaborated with notable colleagues, including Sheng-Liang Pan and Yu-Kung Hsiao. Their teamwork exemplifies the spirit of innovation and shared knowledge essential for achieving groundbreaking results in technology.

Conclusion

Kuo-Liang Lu represents the pioneering spirit of inventors in the semiconductor field. With a solid track record of patents and innovative solutions, he continues to inspire future generations of engineers and inventors in Taiwan and beyond. His contributions not only enhance technological capabilities but also pave the way for advancements in various applications within the semiconductor industry.

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