Osaka, Japan

Kouji Nishino

This inventor holds 155 USPTO granted patents and 18 published patent applications and 2 EPO patents, primarily in Fluid Control Technology (CPC class G05D7-0635). Top assignees: Fujikin Inc., Tokyo Electron Limited, Tohoku University. Active years: 2000-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kouji Nishino. Retrieved from https://idiyas.com/inventor/kouji-nishino

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 155 

% Patents Active = 85.8

 

Average Co-Inventor Count = 5.9

ph-index = 17

Forward Citations = 1,023(Granted Patents)

Forward Citations (Not Self Cited) = 834(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Osaka-fu, JP (2001 - 2002)
  • Nishi-ku, JP (2006)
  • Osaka-shi, JP (2023)
  • Osaka, JP (2000 - 2024)

Company Filing History:


Years Active: 2000-2026

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Areas of Expertise:
Pressure Sensor
Flow Rate Control
Concentration Measurement
Fluid Control Device
Vaporization Supply
Density Measurement
Abnormality Detection
Diaphragm Valve
Self-Diagnosis Method
Fluid Supply System
Liquid Level Meter
Piezoelectric Element
155 patents (USPTO):Explore Patents

Title: Kouji Nishino: Innovations in Pressure Sensor Technology

Introduction:

Kouji Nishino, an innovative inventor hailing from Osaka, Japan, has made significant contributions to the field of pressure sensor technology. With a remarkable portfolio of 134 patents, Nishino has consistently pushed the boundaries of what is possible in this domain. This article explores some of his latest patents, career highlights, collaborations, and highlights his exceptional work in the industry.

Latest Patents:

One of Nishino's most recent patents is titled "Diaphragm type pressure sensor arrangement having corrosion resistance and yield strength." This invention showcases Nishino's expertise in creating pressure sensors capable of withstanding corrosive environments. The cylindrical member, made of a nickel-molybdenum-chromium alloy or stainless steel, is attached to a fluid passage. The pressure sensor unit, made of a cobalt-nickel alloy, includes a diaphragm and a pressure-detecting element for accurately measuring fluid pressure.

Additionally, Nishino has also patented a "Flow rate control device and flow rate control method." This invention introduces a control valve system with a flow rate measurement unit and a controller. The controller ensures that the opening and closing operations of the control valve align with the desired fluid flow rate, as measured by the flow rate measurement unit. This innovation offers precise and efficient control over fluid flow rates.

Career Highlights:

Throughout his career, Nishino has made significant contributions to the field of pressure sensor technology, earning him recognition and acclaim. Notably, he has worked at Fujikin Inc., a prominent company specializing in fluid and gas flow control systems. His collaborations and innovations within Fujikin Inc. have aided in advancing the company's expertise in pressure sensor technology, further solidifying their reputation in the industry.

Collaborations:

Nishino has had the privilege of collaborating with esteemed individuals in the field of pressure sensor technology, notably Nobukazu Ikeda and Ryousuke Dohi. These collaborative efforts have contributed to innovative breakthroughs in pressure sensor designs, propelling the field forward and inspiring future advancements.

Conclusion:

Kouji Nishino's impressive portfolio of 134 patents and his contributions to pressure sensor technology make him a highly esteemed innovator in the industry. His recent patents showcase his ability to create pressure sensors designed for challenging environments, as well as his expertise in flow rate control systems. Through his collaborations and career achievements, Nishino continues to pave the way for advancements in pressure sensor technology, benefiting industries worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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