The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 17, 2025

Filed:

Dec. 03, 2020
Applicant:

Fujikin Incorporated, Osaka, JP;

Inventors:

Kaoru Hirata, Osaka, JP;

Kouji Nishino, Osaka, JP;

Katsuyuki Sugita, Osaka, JP;

Shinya Ogawa, Osaka, JP;

Keisuke Ideguchi, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01F 1/34 (2006.01); G05D 16/20 (2006.01); H01L 21/3065 (2006.01); H01L 21/66 (2006.01); G01F 1/48 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3065 (2013.01); G05D 16/20 (2013.01); H01L 22/26 (2013.01); G01F 1/34 (2013.01); G01F 1/48 (2013.01); Y10T 137/7759 (2015.04); Y10T 137/7761 (2015.04);
Abstract

A pressure control device includes a pressure control valve, a flow resistance provided downstream of the pressure control valve, a first pressure sensor for measuring a gas pressure between the pressure control valve and the flow resistance, a second pressure sensor for measuring a gas pressure downstream of the flow resistance, and a calculation control circuit connected to the first pressure sensor and the second pressure sensor, wherein the pressure control device controls the gas pressure downstream of the flow resistance by adjusting an opening degree of the pressure control valve based on an output of the second pressure sensor regardless of an output of the first pressure sensor control, and calculates the flow rate of the gas downstream of the flow resistance, based on the outputs of the first and the second pressure sensors.


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