The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 2024

Filed:

Nov. 26, 2020
Applicant:

Fujikin Incorporated, Osaka, JP;

Inventors:

Atsushi Hidaka, Osaka, JP;

Masaaki Nagase, Osaka, JP;

Kouji Nishino, Osaka, JP;

Nobukazu Ikeda, Osaka, JP;

Kaoru Hirata, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01F 25/10 (2022.01); G01F 1/36 (2006.01); G05D 7/06 (2006.01);
U.S. Cl.
CPC ...
G01F 25/15 (2022.01); G01F 1/36 (2013.01); G05D 7/0635 (2013.01);
Abstract

An abnormality detection method is performed in a gas supply system including a flow rate control device having a restriction part, a control valve, a flow rate control pressure sensor for measuring upstream pressure, and a control circuit. The inflow pressure sensor measures the supply pressure. An upstream on/off valve is provided upstream of the inflow pressure sensor. The method includes closing the upstream on/off valve when the gas flows at a controlled flow rate at the downstream of the restriction part by controlling an opening degree of the control valve based on the output of the flow rate control pressure sensor; measuring a drop in supply pressure on the upstream side of the control valve after closing the upstream on/off valve while keeping the control valve open; and detecting the presence or absence of abnormality in the flow rate control device based on the measured supply pressure drop.


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