Fujikin Inc.

Other

Tokyo Electron Limited

Tohoku University

Tokushima University

Tokyo Electron Limi Ted

Nidec Copal Electronics Corporation

Tadahiro Ohmi

Futikin Incorporated

Fuiikin Incorporated

Fujilin Incorporated

Fujkin Incorporated

Kouji Nishino

Nobukazu Ikeda

Ryousuke Dohi

Masaaki Nagase

Kaoru Hirata

Katsuyuki Sugita

Michio Yamaji

Atsushi Hidaka

Yohei Sawada

Takashi Hirose

Tomio Uno

Atsushi Matsumoto

Kazuhiko Sugiyama

Tsutomu Shinohara

Masahiko Takimoto

Naofumi Yasumoto

Shinya Ogawa

Toshihide Yoshida

Eiji Ideta

Kazuteru Tanaka

Jun Hirose

Satoshi Kagatsume

Satoru Yamashita

Takatoshi Nakatani

Toyomi Uenoyama

Keisuke Ideguchi

Osamu Nakamura

Kohei Shigyou

Ryutaro Nishimura

Keiji Hirao

Hiroshi Koizumi

Yoshihiro Deguchi

Koji Kawada

Hiroyuki Fukuda

Kazuyuki Miura

Hideki Nagaoka

Hisashi Tanaka

Tomokazu Imai

Kazuyuki Morisaki

Shoichi Hino

Yukio Minami

Tadayuki Yakushijin

Ryosuke Dohi

Tsuyoshi Shimazu

Takahiro Imai

Masayoshi Kawashima

Tetu Kagazume

Masahito Saito

Kazuhiro Yoshikawa

Akihiro Morimoto

Katsunori Yonehana

Kazuo Fukazawa

Eiji Takahashi

Norihiko Amikura

Migaku Takahashi

Takahiro Matsuda

Tsuyoshi Tanikawa

Atsushi Sawachi

Masafumi Kitano

Mutsunori Koyomogi

Kazuo Fukasawa

Hiroyuki Ito

Susumu Ozawa

Atsuo Tomita

Seiichi Iida

Kyousuke Dohi

Hidekazu Ishii

Yasuyuki Yanai

Tomokazu Hirota

Yoshihiro Satou

Osamu Fukada

Toshio Doh

Shigetoshi Sugawa

Takeshi Nakamura

Yasuyuki Shirai

Akihiro Harada

Rihito Kuroda

Kenji Aikawa

Ryutaro Tanno

Yohei Uchida

Risako Miyoshi

Kenta Kondo

Kazuyuki Tezuka

Norikazu Sasaki

Hiroshi Kannan

Hideyuki Miyagawa

Takashi Fukawa

Yuto Kawauchi

Yoshiharu Kishida

Tooru Hirai

Atushi Hidaka

Atsushi Nagata

Tsuyoshi Tanigawa

Tetsuo Naritomi

Kenetu Mizusawa

A concentration measurement devicefor measuring the concentration of the a gas flowing through a junction blockconnected to a plurality of gas supply lines includes a light sourcefor generating light incident to a flow path formed in the junction block, a photodetectorfor receiving light emitting from the flow path, and an arithmetic control circuitfor determining the concentration of the gas flowing through the flow path based on the output of the photodetector, translucent incident windowsandfor making light from the light source incident to the flow path and, at least one of the translucent emitting windowsandfor emitting light passing through the flow path being sealed and fixed to the junction block

Concentration measurement device

A cover componentis used for a pressure sensorthat is fixed to a mounting surfaceS of a bodywith a flow path Fformed therein, and that has protrudes protruding from the mounting surfaceS, the cover component comprising a hollow memberhaving an inner peripheral surface facing a side surface of the protruding portion of the pressure sensor, and a cover memberfixed to the hollow memberand covering the protruding portion of the pressure sensor

Cover component for pressure sensor, and pressure sensor device comprising same

A controller capable of improving the disappearance resistance of a synthetic resin coating of a diaphragm, and a vaporization supply device comprising the controller. The controller includes a body having an inflow passage and an outflow passage, a valve seat provided between the inflow passage and the outflow passage, a diaphragm capable of being seated on or separated from the valve seat, and an actuator for causing the diaphragm to be seated on and separated from the valve seat. The material of the valve seat is nickel-based, and the diaphragm is provided with a synthetic resin coating on a surface of a side to be brought into contact with the valve seat.

Controller and vaporization supply device

A pressure control device includes a pressure control valve, a flow resistance provided downstream of the pressure control valve, a first pressure sensor for measuring a gas pressure between the pressure control valve and the flow resistance, a second pressure sensor for measuring a gas pressure downstream of the flow resistance, and a calculation control circuit connected to the first pressure sensor and the second pressure sensor, wherein the pressure control device controls the gas pressure downstream of the flow resistance by adjusting an opening degree of the pressure control valve based on an output of the second pressure sensor regardless of an output of the first pressure sensor control, and calculates the flow rate of the gas downstream of the flow resistance, based on the outputs of the first and the second pressure sensors.

Pressure control device

A flow rate control device () includes a control valve () having a valve element and a piezoelectric element for moving the valve element, and an arithmetic processing circuit () for controlling an operation of the control valve, wherein the arithmetic processing circuit is configured to receive an external command signal SE corresponding to a target flow rate when opening the control valve from a closed state so that a gas flows at the target flow rate, and to generate an internal command signal Eoutput to a driving circuit for determining a voltage applied to the piezoelectric element based on the external command signal, the internal command signal is a signal that rises with time from zero and converges to a value of the external command signal, and is generated such that a slope at the time of initial rise and a slope immediately before convergence are smaller than a slope therebetween.

Flow rate control device and flow rate control method wherein an internal command signal is generated by a combination of first order lag process and ramp process

A fluid control devicecomprises a valve device Vincluding actuatorsandfor opening and closing a flow path and adjusting a flow rate of a fluid flowing through the flow path, a pressure sensor PT provided upstream of the valve device V, and a control circuitconnected to the valve device Vand the pressure sensor PT, and the control circuitcontrols an operation of the actuator based on a pressure measured by the pressure sensor PT and a reference pressure drop curve, while the upstream side of the fluid control device is closed and the valve device is opened using the actuators.

Fluid control device, fluid supply system, and fluid supply method

[Problem] The main purpose of the present invention is to provide a casing for a fluid controller capable of enabling maintenance inside the casing even in a state where the lower part of the casing is fixed to a main body of a fluid controller, and improving maintainability. [Solution] A casingfor covering deviceson a main bodyof a fluid controller, the casingis configured so as to be dividable into a plurality of parts, and the plurality of parts comprising a first partprovided with a fixing portionfor fixing to the main body, a second partattached to the first part, and a third partattachably and detachably provided at an upper partition higher than a predetermined height position of the casing

Casing for fluid controller and fluid controller provided with same

The flow rate control deviceincludes a control valve, a restriction partprovided downstream of the control valve, an upstream pressure sensorfor measuring a pressure Pbetween the control valveand the restriction part, a differential pressure sensorfor measuring a differential pressure ΔP between the upstream and the downstream of the restriction part, and an arithmetic control circuitconnected to the control valve, the upstream pressure sensor, and the differential pressure sensor

Flow rate control device

The concentration measurement deviceincludes an electric unithaving a light sourceand a photodetector, a fluid unithaving a measurement cell, a first light-transmission memberfor transmitting light from the light source to the measurement cell, a second light transmission memberfor transmitting light from the measurement cell to the photodetector, a lensA provided in the fluid unit, the lensA being arranged such that light from the first light transmission member is to be incident on the first position and light is to be emitted from the second position to the second light transmission member, a pressure sensorfor measuring pressure of fluid flowing through the measurement cell, and an arithmetic circuitfor detecting concentration of the fluid flowing through the measurement cell, the arithmetic circuit being configured to calculate the fluid concentration based on the output of the photodetector and a correction factor related to the pressure output by the pressure sensor and the concentration of fluid in order to reduce the measurement error due to the refractive index of the fluid.

Density measurement device

A concentration measurement method performed in a concentration measurement device including an electric unit having a light source and a photodetector, a fluid unit having a measurement cell through which a gas flows, and a processing circuit for calculating a concentration of the gas based on an intensity of a light passing through the measurement cell. The concentration measurement method includes a step of determining an absorption coefficient of the measurement gas using a reference absorption coefficient determined in association with the reference gas and a correction factor associated with the measurement gas, and a step of obtaining a concentration of the measurement gas flowing in the measurement cell using the absorption coefficient of the measurement gas. When the absorption peak wavelength of the measurement gas is longer than the peak wavelength of the light source, a reference gas having a longer absorption peak wavelength than the peak wavelength of the light source is used, and when the absorption peak wavelength of the measurement gas is shorter than the peak wavelength of the light source, a reference gas having a shorter absorption peak wavelength than the peak wavelength of the light source is used.

Concentration measuring method, and concentration measuring device

A flow rate control deviceincludes a control valveprovided in a flow path, a flow rate measurement unitfor measuring fluid flow rate controlled by the control valve, and a controller. The controlleris configured so as to control the opening/closing operation of the control valveto match the measurement integral flow rate based on the signal outputted from the flow rate measurement unit (Vn+Vd) to the target integral flow rate Vs.

Flow rate control device and flow rate control method

The driving device includes a piezoelectric element, a power supply unit, a first resistor, a second resistor, a measuring unit and a control unit, wherein resistance values of the first resistor and the second resistor are smaller than an insulating resistance value of the piezoelectric element, the measuring unit measures, a voltage across the first resistor (voltage between a first terminal and a second terminal), in a state of supplying a predetermined voltage from the power supply unit, and the control unit calculates a resistance value of the piezoelectric element from a voltage value obtained by the measurement of the measuring unit, and determines, whether or not degradation has occurred in the piezoelectric element based on the calculated resistance value.

Driving device provided with piezoelectric element deterioration detection circuit and deterioration detection method

An abnormality detection method is performed in a gas supply system including a flow rate control device having a restriction part, a control valve, a flow rate control pressure sensor for measuring upstream pressure, and a control circuit. The inflow pressure sensor measures the supply pressure. An upstream on/off valve is provided upstream of the inflow pressure sensor. The method includes closing the upstream on/off valve when the gas flows at a controlled flow rate at the downstream of the restriction part by controlling an opening degree of the control valve based on the output of the flow rate control pressure sensor; measuring a drop in supply pressure on the upstream side of the control valve after closing the upstream on/off valve while keeping the control valve open; and detecting the presence or absence of abnormality in the flow rate control device based on the measured supply pressure drop.

Abnormality detection method for flow rate control device, and flow rate monitoring method

A diaphragm valve includes a body () having a flow path (), a seat () formed in the flow path (), a metal diaphragm () for opening and closing the flow path (), a pair of clamping parts () and () for claiming peripheral edge portions of the metal diaphragm () to fix the metal diaphragm () to the body (), and an actuator () for abutting the metal diaphragm () to the seat () or separating the metal diaphragm from the seat (), wherein a fluorine resin coating is formed on a seat side surface () of the metal diaphragm () at least in a contact region (B-A) with the seat () in a region (C) surrounded by a clamping region (D-C) between the seat side surface () and one of the pair of clamping portions (), excluding the clamping region (D-C).

Diaphragm valve

Growing community of inventors

Osaka, Japan

Kouji Nishino