Introduction: Kong-Soo Lee is a prominent inventor based in Gyeonggi-do, South Korea, holding an impressive portfolio of 20 patents. His work predominantly revolves around the field of semiconductor devices, reflecting significant contributions to modern electronics.

Latest Patents: Among his latest innovations, Kong-Soo Lee has developed a groundbreaking semiconductor device that features a substrate and a conductive line extending in a horizontal direction. This design incorporates an isolation insulating layer that intersects with the conductive line and defines a channel trench. The trench is equipped with a crystalline oxide semiconductor layer that makes contact with the conductive line as well as a gate electrode residing within the channel trench. Additionally, Kong-Soo has devised methods for forming silicon layers and patterns, which enhance the manufacturing process for semiconductor devices. These methods involve creating sacrificial patterns and applying silicon-sulfur compounds to form silicon-containing mask patterns.

Career Highlights: Kong-Soo Lee's career has been notably marked by his tenure at Samsung Electronics Co., Ltd., where he has played a crucial role in advancing semiconductor technologies. His patent contributions have set benchmarks in the industry, showcasing his innovative capabilities in a rapidly evolving technological landscape.

Collaborations: Throughout his career, Kong-Soo has collaborated with esteemed colleagues, including Jae-Jong Han and Sang-Jin Park. Together, they have contributed their expertise to enhance the research and development initiatives at Samsung Electronics, further driving innovation in semiconductor technology.

Conclusion: Kong-Soo Lee's inventions and patents have significantly impacted the semiconductor industry, making him a key player in advancing electronic technologies. His ongoing commitment to innovation is evidenced by his prolific output and successful collaborations, establishing him as a leading inventor in the field.

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