Beaverton, OR, United States of America

Kevin Lai Lin

This inventor holds 105 USPTO granted patents and 19 published patent applications and 4 EPO patents, primarily in Integrated Circuits (CPC class H01L23-5226). Top assignees: Intel Corporation, Sk Hynix Nand Product Solutions Corp. (Dba Solidigm), Tahoe Research, Ltd.. Active years: 2014-2026.

USPTO Granted Patents = 105 

% Patents Active = 80.0

 

Average Co-Inventor Count = 3.6

ph-index = 6

Forward Citations = 123(Granted Patents)

Forward Citations (Not Self Cited) = 86(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Chandler, AZ (US) (2015 - 2017)
  • Beaverton, OR (US) (2014 - 2024)

Company Filing History:


Years Active: 2014-2026

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Areas of Expertise:
Integrated Circuits
Interconnect Structures
Thermal Management
Lithography
Thin Film Transistors
Metal Patterning
Electrobucket Sensitivity
Wafer Bonding
Magnetic Memory Devices
Air Gapping
Core Fill
Semiconductor Devices
105 patents (USPTO):Explore Patents

Title: A Closer Look at Kevin Lai Lin: Innovator in Patent Technologies

Introduction

Kevin Lai Lin, based in Beaverton, Oregon, is a prominent inventor known for his significant contributions in the field of technology, with an impressive portfolio of 98 patents. His work primarily focuses on advanced lithography techniques and innovative methods for forming interconnects, highlighting his expertise in the realm of semiconductor manufacturing and device fabrication.

Latest Patents

Among his latest patents is a groundbreaking invention titled "Textile patterning for subtractively-patterned self-aligned interconnects, plugs, and vias." This invention introduces methods for creating a textile patterned hardmask, which involves the formation of a first and second hardmask over an interconnect layer in an alternating manner. The process includes the creation of a sacrificial cross-grating and strategically removing portions of the first hardmask to develop openings for further applications. Furthermore, the complexity of the invention is increased by employing etch-selective hardmasks, facilitating advanced processing capabilities. Another notable patent focuses on "Advanced lithography and self-assembled devices," which pertains to sub-10 nm pitch patterning and the fabrication of self-assembled devices, underscoring the cutting-edge nature of his research.

Career Highlights

Kevin has made a profound impact in the tech industry through his tenure at well-respected companies such as Intel Corporation and Tahoe Research, Ltd. His experience within these organizations has aided in refining his skills and enhancing his contributions to the field of semiconductor technologies.

Collaborations

Throughout his career, Kevin has collaborated with notable professionals, including Manish Chandhok and Robert L. Bristol. Their collective expertise has undoubtedly played a role in the success of their shared projects and innovations.

Conclusion

In conclusion, Kevin Lai Lin stands out as a prolific inventor whose work continues to advance the fields of semiconductor technology and advanced lithography. With an extensive portfolio of patents and a dynamic career, he remains a key figure in driving innovation and development in his field.

Profile summary based on public USPTO records.
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