Austin, TX, United States of America

Kevin D Lucas

USPTO Granted Patents = 16 

Average Co-Inventor Count = 3.6

ph-index = 12

Forward Citations = 774(Granted Patents)


Company Filing History:


Years Active: 1998-2024

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16 patents (USPTO):Explore Patents

Title: Exploring the Innovations of Kevin D. Lucas

Introduction

Kevin D. Lucas, an accomplished inventor based in Austin, Texas, has made significant contributions to the field of lithography with a portfolio of 16 patents. His work focuses on the development of advanced lithographic models and processes, which play a crucial role in semiconductor manufacturing.

Latest Patents

Among his latest innovations is the patent titled "Stochastic-aware Lithographic Models for Mask Synthesis." This patent outlines a method for accessing mask patterns used in lithography processes. It employs a deterministic model that predicts characteristics of printed patterns while accounting for local stochastic variations.

Another notable patent is the "Method and Apparatus for Determining Mask Layouts for a Spacer-is-Dielectric Self-Aligned Double-Patterning Process." This invention describes methods for creating mask layouts that fulfill design intents on wafers. The system determines if a graph related to the design intent is two-colorable and modifies the design if necessary, facilitating effective mask layout for printing.

Career Highlights

Throughout his career, Kevin has worked with renowned companies, including Motorola Corporation and Freescale Semiconductor, where he has played vital roles in advancing semiconductor technology through his innovative solutions and expertise in lithography.

Collaborations

Kevin has collaborated with esteemed colleagues in the field, including Alfred J. Reich and Michael E. Kling. Their combined expertise has enabled the development of cutting-edge technologies that propel the semiconductor industry forward.

Conclusion

Kevin D. Lucas exemplifies the spirit of innovation and dedication to technological advancements in lithography. His patents reflect a commitment to addressing complex challenges in semiconductor manufacturing, paving the way for future developments in the industry.

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