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For the Inventor, By the Inventor

Austin, TX, United States of America

Kevin D Lucas

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This inventor holds 16 USPTO granted patents and 1 published patent application, primarily in Lithographic Technologies. Top assignees: Motorola Corporation, Freescale Semiconductor,inc., Synopsys, Inc.. Active years: 1998-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kevin D Lucas. Retrieved from https://idiyas.com/inventor/kevin-d-lucas

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 16 

% Patents Active = 93.8

Average Co-Inventor Count = 3.6

ph-index = 12

Forward Citations = 776(Granted Patents)


Company Filing History:

goldMedal11 out of 20,290 
 
Motorola Corporation
 patents
silverMedal3 out of 5,491 
 
Freescale Semiconductor,inc.
 patents
bronzeMedal2 out of 2,613 
 
Synopsys, Inc.
 patents

Years Active: 1998-2024

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Areas of Expertise:
Lithographic Models
Mask Layouts
Flare Reduction
Semiconductor Device
Lithography Correction
Reticle Manufacturing
Copper Interconnects
Anti-Reflective Coatings
Proximity Correction
Dielectric Layers
Metallic Gate Electrode
Hardmask Formation
16 patents (USPTO):Explore Patents
1. 11900042 - Stochastic-aware lithographic models for mask synthesis (2024-02-13),
2. 8312394 - Method and apparatus for determining mask layouts for a spacer-is-dielectric self-aligned double-patterning process (2012-11-13),
3. 6989229 - Non-resolving mask tiling method for flare reduction (2006-01-24),
4. 6933227 - Semiconductor device and method of forming the same (2005-08-23),
5. 6783904 - Lithography correction method and device (2004-08-31),
6. 6649452 - Method for manufacturing a lithographic reticle for transferring an integrated circuit design to a semiconductor wafer (2003-11-18),
7. 6294820 - Metallic oxide gate electrode stack having a metallic gate dielectric metallic gate electrode and a metallic arc layer (2001-09-25),
8. 6287951 - Process for forming a combination hardmask and antireflective layer (2001-09-11),
9. 6174810 - Copper interconnect structure and method of formation (2001-01-16),
10. 6004850 - Tantalum oxide anti-reflective coating (ARC) integrated with a metallic (1999-12-21),
11. 5958635 - Lithographic proximity correction through subset feature modification (1999-09-28),
12. 5920487 - Two dimensional lithographic proximity correction using DRC shape (1999-07-06),
13. 5900340 - One dimensional lithographic proximity correction using DRC shape (1999-05-04),
14. 5849440 - Process for producing and inspecting a lithographic reticle and (1998-12-15),
15. 5827625 - Methods of designing a reticle and forming a semiconductor device (1998-10-27),

Title: Exploring the Innovations of Kevin D. Lucas

Introduction

Kevin D. Lucas, an accomplished inventor based in Austin, Texas, has made significant contributions to the field of lithography with a portfolio of 16 patents. His work focuses on the development of advanced lithographic models and processes, which play a crucial role in semiconductor manufacturing.

Latest Patents

Among his latest innovations is the patent titled "Stochastic-aware Lithographic Models for Mask Synthesis." This patent outlines a method for accessing mask patterns used in lithography processes. It employs a deterministic model that predicts characteristics of printed patterns while accounting for local stochastic variations.

Another notable patent is the "Method and Apparatus for Determining Mask Layouts for a Spacer-is-Dielectric Self-Aligned Double-Patterning Process." This invention describes methods for creating mask layouts that fulfill design intents on wafers. The system determines if a graph related to the design intent is two-colorable and modifies the design if necessary, facilitating effective mask layout for printing.

Career Highlights

Throughout his career, Kevin has worked with renowned companies, including Motorola Corporation and Freescale Semiconductor, where he has played vital roles in advancing semiconductor technology through his innovative solutions and expertise in lithography.

Collaborations

Kevin has collaborated with esteemed colleagues in the field, including Alfred J. Reich and Michael E. Kling. Their combined expertise has enabled the development of cutting-edge technologies that propel the semiconductor industry forward.

Conclusion

Kevin D. Lucas exemplifies the spirit of innovation and dedication to technological advancements in lithography. His patents reflect a commitment to addressing complex challenges in semiconductor manufacturing, paving the way for future developments in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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