The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2024
Filed:
Nov. 09, 2021
Applicant:
Synopsys, Inc., Mountain View, CA (US);
Inventors:
Kevin Dean Lucas, Austin, TX (US);
Yudhishthir Prasad Kandel, Durham, NC (US);
Ulrich Welling, Dornach, DE;
Ulrich Karl Klostermann, Munich, DE;
Zachary Adam Levinson, Austin, TX (US);
Assignee:
Synopsys, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/30 (2020.01); G03F 7/00 (2006.01); G06F 30/398 (2020.01); G03F 1/36 (2012.01); G03F 1/70 (2012.01);
U.S. Cl.
CPC ...
G06F 30/398 (2020.01); G03F 1/36 (2013.01); G03F 1/70 (2013.01); G03F 7/705 (2013.01); G03F 7/70433 (2013.01); G03F 7/70441 (2013.01);
Abstract
In some aspects, a mask pattern is accessed. The mask pattern is for use in a lithography process that prints a pattern on a wafer. The mask pattern is applied as input to a deterministic model of the lithography process to predict a characteristic of the printed pattern. The deterministic model is deterministic, but it accounts for local stochastic variations of the characteristic in the printed pattern.