Austin, TX, United States of America

Zachary Adam Levinson

USPTO Granted Patents = 3 

Average Co-Inventor Count = 2.9

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Austin, TX (US) (2022 - 2024)
  • Mountain View, CA (US) (2024)

Company Filing History:


Years Active: 2022-2024

Loading Chart...
3 patents (USPTO):

Title: Innovations of Zachary Adam Levinson

Introduction

Zachary Adam Levinson is a prominent inventor based in Austin, TX, known for his contributions to the field of semiconductor technology. He holds three patents that showcase his expertise in lithography processes and mask data improvements.

Latest Patents

One of his latest patents is titled "Stochastic-aware lithographic models for mask synthesis." This invention involves accessing a mask pattern used in a lithography process that prints a pattern on a wafer. The mask pattern serves as input to a deterministic model of the lithography process, which predicts characteristics of the printed pattern while accounting for local stochastic variations. Another significant patent is "Stochastic optical proximity corrections." This method enhances mask data used in semiconductor device fabrication by setting a threshold value associated with defects based on their stochastic failure rates. The process includes performing optimal proximity corrections and identifying locations where stochastically determined mask pattern contours may lead to defects.

Career Highlights

Zachary Adam Levinson is currently employed at Synopsys, Inc., where he applies his innovative ideas to advance semiconductor technologies. His work has significantly impacted the efficiency and accuracy of lithography processes in the industry.

Collaborations

He collaborates with notable colleagues, including Yudhishthir Prasad Kandel and Ulrich Welling, contributing to a dynamic and innovative work environment.

Conclusion

Zachary Adam Levinson's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence advancements in lithography and mask data optimization.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…