The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 1998
Filed:
Aug. 18, 1997
Kevin Lucas, Austin, TX (US);
Michael E Kling, Austin, TX (US);
Bernard J Roman, Austin, TX (US);
Alfred J Reich, Austin, TX (US);
Motorola, Inc., Schaumburg, IL (US);
Abstract
A process for designing and forming a reticle (40) as well as the manufacture of a semiconductor substrate (50) using that reticle (40). The present invention places outriggers (32, 34, 36) between features (30) in both dense and semi-dense feature patterns to assist in the patterning of device features. The width of the outriggers can be changed based on pitch and location between features in a semi-dense or dense feature pattern. In one embodiment, the outriggers can be manually or automatically inserted into the layout file after the locations of the attenuating features have been determined. The outriggers are not patterned on the substrate, but assist in forming resist features of uniform width.